Reduced defect density in microcrystalline silicon by hydrogen plasma treatment | |
Li Jingyan ; Zeng Xiangbo ; Li Hao ; Xie Xiaobing ; Yang Ping ; Xiao Haibo ; Zhang Xiaodong | |
刊名 | journal of semiconductors |
2013 | |
卷号 | 34期号:10页码:103006 |
学科主题 | 光电子学 |
收录类别 | EI |
语种 | 英语 |
公开日期 | 2014-05-08 |
内容类型 | 期刊论文 |
源URL | [http://ir.semi.ac.cn/handle/172111/24932] |
专题 | 半导体研究所_集成光电子学国家重点实验室 |
推荐引用方式 GB/T 7714 | Li Jingyan,Zeng Xiangbo,Li Hao,et al. Reduced defect density in microcrystalline silicon by hydrogen plasma treatment[J]. journal of semiconductors,2013,34(10):103006. |
APA | Li Jingyan.,Zeng Xiangbo.,Li Hao.,Xie Xiaobing.,Yang Ping.,...&Zhang Xiaodong.(2013).Reduced defect density in microcrystalline silicon by hydrogen plasma treatment.journal of semiconductors,34(10),103006. |
MLA | Li Jingyan,et al."Reduced defect density in microcrystalline silicon by hydrogen plasma treatment".journal of semiconductors 34.10(2013):103006. |
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