Strain-dependent vacuum annealing effects in La0.67Ca0.33MnO3-delta films | |
Sun, JR ; Yeung, CF ; Zhao, K ; Zhou, LZ ; Leung, CH ; Wong, HK ; Shen, BG | |
刊名 | APPLIED PHYSICS LETTERS |
2000 | |
卷号 | 76期号:9页码:1164 |
关键词 | THIN-FILMS OXYGEN STOICHIOMETRY MAGNETORESISTANCE LA0.7CA0.3MNO3 RESISTIVITY |
ISSN号 | 0003-6951 |
通讯作者 | Sun, JR (reprint author), Chinese Acad Sci, Inst Phys, State Key Lab Magnetism, POB 603, Beijing 100080, Peoples R China. |
中文摘要 | The effects of vacuum annealing on the structural and transport properties of the La0.67Ca0.33MnO3-delta films grown on SrTiO3 (LCMO/STO) and NdGaO3 (LCMO/NGO) substrates have been studied. A lattice expansion due to oxygen release during the annealing is observed. Under the same condition, the change of the out-of-plane lattice parameter in LCMO/STO is two to three times larger than that in LCMO/NGO, indicating a strong tendency for the oxygen in the former to escape. Correspondingly, the metal-to-semiconductor transition shifts to lower temperatures, linearly with lattice constant until a critical value, Delta d = 0.03 Angstrom for LCMO/STO and Delta d = 0.05 Angstrom for LCMO/NGO, after which a sudden drop of the transition temperature to zero occurs. The different lattice strains in both films are presumably responsible for the different critical oxygen contents for the occurrence of the resistive transition. (C) 2000 American Institute of Physics. [S0003-6951(00)03209-5]. |
收录类别 | SCI |
语种 | 英语 |
公开日期 | 2013-09-24 |
内容类型 | 期刊论文 |
源URL | [http://ir.iphy.ac.cn/handle/311004/53118] |
专题 | 物理研究所_物理所公开发表论文_物理所公开发表论文_期刊论文 |
推荐引用方式 GB/T 7714 | Sun, JR,Yeung, CF,Zhao, K,et al. Strain-dependent vacuum annealing effects in La0.67Ca0.33MnO3-delta films[J]. APPLIED PHYSICS LETTERS,2000,76(9):1164. |
APA | Sun, JR.,Yeung, CF.,Zhao, K.,Zhou, LZ.,Leung, CH.,...&Shen, BG.(2000).Strain-dependent vacuum annealing effects in La0.67Ca0.33MnO3-delta films.APPLIED PHYSICS LETTERS,76(9),1164. |
MLA | Sun, JR,et al."Strain-dependent vacuum annealing effects in La0.67Ca0.33MnO3-delta films".APPLIED PHYSICS LETTERS 76.9(2000):1164. |
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