| Principle and applications of helicon-wave excited plasma sources (in Chinese) | |
| T.Z. Fang | |
| 刊名 | Physics
 |
| 1999 | |
| 卷号 | 28页码:162 |
| 公开日期 | 2013-09-24 |
| 内容类型 | 期刊论文 |
| 源URL | [http://ir.iphy.ac.cn/handle/311004/51461]  |
| 专题 | 物理研究所_物理所公开发表论文_物理所公开发表论文_期刊论文 |
| 推荐引用方式 GB/T 7714 | T.Z. Fang. Principle and applications of helicon-wave excited plasma sources (in Chinese)[J]. Physics,1999,28:162. |
| APA | T.Z. Fang.(1999).Principle and applications of helicon-wave excited plasma sources (in Chinese).Physics,28,162. |
| MLA | T.Z. Fang."Principle and applications of helicon-wave excited plasma sources (in Chinese)".Physics 28(1999):162. |
| 个性服务 |
| 查看访问统计 |
| 相关权益政策 |
| 暂无数据 |
| 收藏/分享 |
除非特别说明，本系统中所有内容都受版权保护，并保留所有权利。
修改评论