The antiferromagnetic coupling and interface diffusion in Fe/Si multilayers

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	The antiferromagnetic coupling and interface diffusion in Fe/Si multilayers
	Jing, N ; Cai, JW ; Zhao, JG ; Yan, SS ; Mei, LM ; Zhu, SF
刊名	ACTA PHYSICA SINICA
	2004
卷号	53 期号:11 页码:3920
关键词	MAGNETORESISTANCE SUPERLATTICES
ISSN号	1000-3290
通讯作者	Jing, N (reprint author), Chinese Acad Sci, Inst Phys, State Key Lab Magnetism, Beijing 100080, Peoples R China.
中文摘要	La0.67Ca0.33MnO3 films with thickness between 25 and 400nm were fabricated on (001) SrTiO3 and (001) LaAlO3 substrates, using pulsed laser deposition. The magnetization and resistivity p of the films were studied as functions of thickness. The reduction of t causes the decrease of the Curie temperature T-C in addition to the increase of p of the films. Compared with the compressive strain in the La0.67Ca0.33MnO3/LaAlO3 films I the tensile strain in the La0.67Ca0.33MnO3/SrTiO3 films causes a faster reduction of T-C with t, and a larger value of rho(0). The low-temperature rho is found to follow well rho = rho(0) + Bomega(s)/sinh(2) (homega(s)/2k(B)T) + CTn, with rho(0) being the residual resistivity. The second term arises from the scattering by a soft optical phonon mode, and the third term denotes the other possible transport mechanisms. B, omega(s) ( the frequency of a soft optical mode) and C are fitting parameters. At temperatures higher than T-C, rho of all the films show activated conduction with rho = DTexp(E-a/k(B) T). Here, E-a is the activation energy. Based on the investigation of rho(0), omega(s) and E-a,E- the thickness and strain effects in the films are discussed, separately. Further study shows that the variation of T-C is mainly associated with E-a and omega(a), confirming the crucial role of the electron-phonon coupling in the strain effects on T-C.
收录类别	SCI
语种	中文
公开日期	2013-09-23
内容类型	期刊论文
源URL	[http://ir.iphy.ac.cn/handle/311004/44895]
专题	物理研究所_物理所公开发表论文_物理所公开发表论文_期刊论文
推荐引用方式 GB/T 7714	Jing, N,Cai, JW,Zhao, JG,et al. The antiferromagnetic coupling and interface diffusion in Fe/Si multilayers[J]. ACTA PHYSICA SINICA,2004,53(11):3920.
APA	Jing, N,Cai, JW,Zhao, JG,Yan, SS,Mei, LM,&Zhu, SF.(2004).The antiferromagnetic coupling and interface diffusion in Fe/Si multilayers.ACTA PHYSICA SINICA,53(11),3920.
MLA	Jing, N,et al."The antiferromagnetic coupling and interface diffusion in Fe/Si multilayers".ACTA PHYSICA SINICA 53.11(2004):3920.