MBE growth and X-ray study of high-quality cubic-GaN on GaAs(001) | |
Li, ZQ ; Chen, H ; Liu, HF ; Li, JH ; Wan, L ; Liu, S ; Huang, Q ; Zhou, JM | |
刊名 | JOURNAL OF CRYSTAL GROWTH |
2000 | |
卷号 | 208期号:1-4页码:786 |
关键词 | MOLECULAR-BEAM EPITAXY VAPOR-PHASE EPITAXY GALLIUM NITRIDE STIMULATED-EMISSION THIN-FILMS 001 GAAS SILICON MICROSTRUCTURE SAPPHIRE |
ISSN号 | 0022-0248 |
通讯作者 | Chen, H: Chinese Acad Sci, Inst Phys, POB 603, Beijing 100080, Peoples R China. |
中文摘要 | High-quality cubic GaN epilayer on GaAs(0 0 1) was grown by molecular beam epitaxy equipped with radio frequency nitrogen source. The optimized growth condition is to grow two monolayers thick initial GaN at 600 degrees C under As atmosphere. X-ray diffraction rocking curve shows that the full-width at half-maximum of cubic GaN(0 0 2) diffraction peak is 10 arcmin. The X-ray reciprocal space mapping is used to identify the secondary hexagonal phase and estimate their relative content. (C) 2000 Elsevier Science B.V. All rights reserved. |
收录类别 | SCI |
语种 | 英语 |
公开日期 | 2013-09-18 |
内容类型 | 期刊论文 |
源URL | [http://ir.iphy.ac.cn/handle/311004/41791] |
专题 | 物理研究所_物理所公开发表论文_物理所公开发表论文_期刊论文 |
推荐引用方式 GB/T 7714 | Li, ZQ,Chen, H,Liu, HF,et al. MBE growth and X-ray study of high-quality cubic-GaN on GaAs(001)[J]. JOURNAL OF CRYSTAL GROWTH,2000,208(1-4):786. |
APA | Li, ZQ.,Chen, H.,Liu, HF.,Li, JH.,Wan, L.,...&Zhou, JM.(2000).MBE growth and X-ray study of high-quality cubic-GaN on GaAs(001).JOURNAL OF CRYSTAL GROWTH,208(1-4),786. |
MLA | Li, ZQ,et al."MBE growth and X-ray study of high-quality cubic-GaN on GaAs(001)".JOURNAL OF CRYSTAL GROWTH 208.1-4(2000):786. |
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