Influence of pulsed substrate bias on the structure and properties of Ti-Al-N films deposited by cathodic vacuum arc

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	Influence of pulsed substrate bias on the structure and properties of Ti-Al-N films deposited by cathodic vacuum arc
	Zhang, GP ; Gao, GJ ; Wang, XQ ; Lv, GH ; Zhou, L ; Chen, H ; Pang, H ; Yang, SZ
刊名	APPLIED SURFACE SCIENCE
	2012
卷号	258 期号:19 页码:7274
关键词	HIGH-SPEED STEEL CUTTING TOOLS TIALN COATINGS HARD COATINGS THIN-FILMS (TI ORIENTATION EVAPORATION VOLTAGE DC AL)N
ISSN号	0169-4332
通讯作者	Zhang, GP: Chinese Acad Sci, Inst Phys, POB 603, Beijing 100080, Peoples R China.
中文摘要	Ti-Al-N films were deposited by cathodic vacuum arc (CVA) technique in N-2 atmosphere with different pulsed substrate bias. The influence of pulsed substrate bias (0 to -800 V) on the deposition rate, surface morphology, crystal structure, and mechanical properties of the Ti-Al-N films were systematically investigated. Increasing pulsed bias voltage resulted in the decrease of deposition rate but the increase of surface roughness. It was found that there was a strong correlation between the pulsed bias and film structure. All the films studied in this paper were composed of TiN, AlN, and Ti-Al-N ternary phases. The grains changed from equiaxial to columnar and exhibited preferred orientation when the pulsed bias increased. With the increase of pulsed bias voltage, the atomic ratio of Ti to Al element increased gradually, while the N to (Ti + Al) ratio decreased. The composite films present an enhanced nanohardness compared with binary TiN and ZrN films. The film deposited with pulsed bias of -200 V possessed the maximum scratch critical load and nanohardness. The minimum friction coefficient with pulsed bias of -300 V was obtained. (C) 2012 Elsevier B.V. All rights reserved.
收录类别	SCI
资助信息	National Natural Science Foundation of China [11005151]
语种	英语
公开日期	2013-09-17
内容类型	期刊论文
源URL	[http://ir.iphy.ac.cn/handle/311004/39878]
专题	物理研究所_物理所公开发表论文_物理所公开发表论文_期刊论文
推荐引用方式 GB/T 7714	Zhang, GP,Gao, GJ,Wang, XQ,et al. Influence of pulsed substrate bias on the structure and properties of Ti-Al-N films deposited by cathodic vacuum arc[J]. APPLIED SURFACE SCIENCE,2012,258(19):7274.
APA	Zhang, GP.,Gao, GJ.,Wang, XQ.,Lv, GH.,Zhou, L.,...&Yang, SZ.(2012).Influence of pulsed substrate bias on the structure and properties of Ti-Al-N films deposited by cathodic vacuum arc.APPLIED SURFACE SCIENCE,258(19),7274.
MLA	Zhang, GP,et al."Influence of pulsed substrate bias on the structure and properties of Ti-Al-N films deposited by cathodic vacuum arc".APPLIED SURFACE SCIENCE 258.19(2012):7274.