Correction of a digital micromirror device lithography system for fabrication of a pixelated liquid crystal micropolarizer array
C. Liu; S. Y. Zhang; Y. Q. Liu; M. Y. Lu; W. H. Cao; L. Huang; H. Zhang; Z. F. Lu; Q. Q. Mu and H. Liu
刊名Optics Express
2022
卷号30期号:7页码:12014-12025
ISSN号1094-4087
DOI10.1364/oe.453800
英文摘要The combination of a digital micromirror device (DMD) lithography system and a rotatable polarizer provides a simple and convenient method to achieve the pixelated liquid crystal micropolarizer (LCMP) array for polarization imaging. In this paper, two crucial problems restricting the high-precision fabrication of LCMP array are pointed out and settled: the dislocation of LCMP pixels caused by parallelism error of the rotating polarizer and the grid defect caused by the gap between micromirrors. After correction, the maximum deviation of the fabricated LCMP pixels was reduced from 3.23 mu m to 0.11 mu m and the grid defect is eliminated. The correction method reported here lays a good foundation for the fine processing of liquid crystal devices with arbitrary photoalignment structure by using the DMD system. (C) 2022 Optica Publishing Group under the terms of the Optica Open Access Publishing Agreement
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语种英语
内容类型期刊论文
源URL[http://ir.ciomp.ac.cn/handle/181722/66493]  
专题中国科学院长春光学精密机械与物理研究所
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GB/T 7714
C. Liu,S. Y. Zhang,Y. Q. Liu,et al. Correction of a digital micromirror device lithography system for fabrication of a pixelated liquid crystal micropolarizer array[J]. Optics Express,2022,30(7):12014-12025.
APA C. Liu.,S. Y. Zhang.,Y. Q. Liu.,M. Y. Lu.,W. H. Cao.,...&Q. Q. Mu and H. Liu.(2022).Correction of a digital micromirror device lithography system for fabrication of a pixelated liquid crystal micropolarizer array.Optics Express,30(7),12014-12025.
MLA C. Liu,et al."Correction of a digital micromirror device lithography system for fabrication of a pixelated liquid crystal micropolarizer array".Optics Express 30.7(2022):12014-12025.
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