Properties of a-C:H:Si thin films deposited by middle-frequency magnetron sputtering

doi:10.1016/j.apsusc.2016.04.014

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	Properties of a-C:H:Si thin films deposited by middle-frequency magnetron sputtering
	Jiang, Jinlong 1,2; Wang, Yubao 1; Du, Jinfang 1; Yang, Hua 1; Hao, Junying 3
刊名	APPLIED SURFACE SCIENCE
	2016-08-30
卷号	379 页码:516-522
关键词	a-C:H:Si films Magnetron sputtering Structure Tribological properties
ISSN号	0169-4332
DOI	10.1016/j.apsusc.2016.04.014
英文摘要	The silicon doped hydrogenated amorphous carbon (a-C:H:Si) films were prepared on silicon substrates by middle-frequency magnetron sputtering silicon target in an argon and methane gas mixture atmosphere. The deposition rate, chemical composition, structure, surface properties, stress, hardness and tribological properties in the ambient air of the films were systemically investigated using X-ray photoelectron spectroscopy (XPS), scanning electron microscope (SEM), atomic force microscopy (AFM), nanoindentation and tribological tester. The results show that doped silicon content in the films is controlled in the wide range from 39.7 at.% to 0.2 at.% by various methane gas flow rate, and methane flow rate affects not only the silicon content but also its chemical bonding structure in the films due to the transformation of sputtering modes. Meanwhile, the sp(3) carbon component in the films linearly increases with increasing of methane flow rate. The film deposited at moderate methane flow rate of 40-60 sccm exhibits the very smooth surface (RMS roughness 0.4 nm), low stress (0.42 GPa), high hardness (21.1 GPa), as well as low friction coefficient (0.038) and wear rate (1.6 x 10(-7) mm(3)/Nm). The superior tribological performance of the films could be attributed to the formation and integral covering of the transfer materials on the sliding surface and their high hardness. (C) 2016 Elsevier B.V. All rights reserved.
资助项目	National Natural Science Foundation of China[51105186]
WOS研究方向	Chemistry ; Materials Science ; Physics
语种	英语
出版者	ELSEVIER SCIENCE BV
WOS记录号	WOS:000376819300068
状态	已发表
内容类型	期刊论文
源URL	[http://119.78.100.223/handle/2XXMBERH/33628]
专题	理学院省部共建有色金属先进加工与再利用国家重点实验室
通讯作者	Jiang, Jinlong; Hao, Junying
作者单位	1.Lanzhou Univ Technol, State Key Lab Adv Proc & Recycling Nonferrous Met, Lanzhou 730050, Peoples R China 2.Lanzhou Univ Technol, Sch Sci, Lanzhou 730050, Peoples R China 3.Chinese Acad Sci, Lanzhou Inst Chem Phys, State Key Lab Solid Lubricat, Lanzhou 730000, Peoples R China
推荐引用方式 GB/T 7714	Jiang, Jinlong,Wang, Yubao,Du, Jinfang,et al. Properties of a-C:H:Si thin films deposited by middle-frequency magnetron sputtering[J]. APPLIED SURFACE SCIENCE,2016,379:516-522.
APA	Jiang, Jinlong,Wang, Yubao,Du, Jinfang,Yang, Hua,&Hao, Junying.(2016).Properties of a-C:H:Si thin films deposited by middle-frequency magnetron sputtering.APPLIED SURFACE SCIENCE,379,516-522.
MLA	Jiang, Jinlong,et al."Properties of a-C:H:Si thin films deposited by middle-frequency magnetron sputtering".APPLIED SURFACE SCIENCE 379(2016):516-522.