Atomic diffusion of Al and Si in Cu44.25Ag 14.75Zr36Ti5 bulk metallic glass

doi:10.4028/www.scientific.net/AMR.510.804

	Atomic diffusion of Al and Si in Cu44.25Ag 14.75Zr36Ti5 bulk metallic glass
	Yu, Weiyuan; Wang, Youliang; Lu, Wenjiang
	2012
会议日期	June 16, 2012 - June 17, 2012
会议地点	Wuhan, China
关键词	Activation energy Aluminum Atoms Machinery Materials science Metallic glass Secondary ion mass spectrometry Silicon Zirconium Arrhenius relations Atomic diffusions Base material Bulk metallic glass Diffusion activation energy Diffusion mechanisms Metal atoms Metallic transition Non-metallic elements Secondary ion mass spectroscopy Si atoms Strong binding Time condition
卷号	510
DOI	10.4028/www.scientific.net/AMR.510.804
页码	804-807
英文摘要	Secondary ion mass spectroscopy (SIMS) has been adopted to study the diffusion of Al and Si in Cu44.25Ag14.75Zr 36Ti5 bulk metallic glass (BMG). It has been found that around the transition temperature of metallic glass, the relation between its diffusion coefficient and the temperature satisfy the same Arrhenius relation, which means the metallic transition has not caused change to the diffusion mechanism. In addition, the radius of Al atom is close to that of Si atom, but under the same temperature and time condition, the diffusion coefficient of Si atom in bulk metallic glass (BMG) is twice that of the Al atom, while there is not a big difference in diffusion activation energy. This is because as non-metallic element, the radius of Si atom has a strong binding force with the metal atoms in the base material, which also has a bigger diffusion coefficient. © (2012) Trans Tech Publications.
会议录	Advanced Materials Research
会议录出版者	Trans Tech Publications, P.O. Box 1254, Clausthal-Zellerfeld, D-38670, Germany
语种	英语
ISSN号	10226680
内容类型	会议论文
源URL	[http://ir.lut.edu.cn/handle/2XXMBERH/115930]
专题	实验室建设与管理处机电工程学院
作者单位	State Key Laboratory of Gansu Advanced Non-errous Metal Materials, Lanzhou University of Technology, Lanzhou 730050, China
推荐引用方式 GB/T 7714	Yu, Weiyuan,Wang, Youliang,Lu, Wenjiang. Atomic diffusion of Al and Si in Cu44.25Ag 14.75Zr36Ti5 bulk metallic glass[C]. 见:. Wuhan, China. June 16, 2012 - June 17, 2012.