Multilayer boron nitride nanofilm as an effective barrier for atomic oxygen irradiation

doi:10.1016/j.apsusc.2019.144394

	Multilayer boron nitride nanofilm as an effective barrier for atomic oxygen irradiation
	Cheng, Li 2,3; Shi, Yanbin 2,3; Hao, Yu 1,2; Li, Wensheng 4; Ren, Siming 2; Wang, Liping 2
刊名	Applied Surface Science
	2020-02-28
卷号	504
关键词	Atoms Boron nitride III-V semiconductors Irradiation Molecular dynamics Molecular oxygen Monolayers Multilayer films Multilayers Nitrides Organic polymers Oxidation Oxidation resistance Anti-oxidation AO irradiations Atomic oxygen Atomic oxygen irradiation Barrier performance Molecular dynamics simulations Nano films Structural analogue
ISSN号	01694332
DOI	10.1016/j.apsusc.2019.144394
英文摘要	Boron nitride (BN) nanofilm, as a structural analogue of graphene, is one of the most promising candidates for an effective anti-oxidation barrier to protect the underlying metal. Herein, the oxidation resistance of monolayer and multilayer BN nanofilms against space atomic oxygen (AO) irradiation is studied systematically. Experimental results reveal that multilayer BN coated Cu foils exhibit superior oxidation resistance against AO irradiation than that of monolayer BN coated ones and bare Cu, resulting from the high impermeability of multilayer films. Density functional theory calculations and molecular dynamics simulations indicate that AO can be absorbed spontaneously on the surface of BN plane and can't move arbitrarily. However, AO can still damage monolayer BN film after long time irradiation, leading to the oxidation of underneath Cu. In comparison to monolayer BN, the multilayer designing of BN may adsorb AO on the top layer, and increases the diffusion difficulties of AO passing layers, which enhances the barrier performance against AO. These results prove that multilayer BN have an important promising implication as one oxidation-inhibiting barrier to anti-AO in space. © 2019 Elsevier B.V.
WOS研究方向	Chemistry ; Materials Science ; Physics
语种	英语
出版者	Elsevier B.V., Netherlands
WOS记录号	WOS:000502040600040
内容类型	期刊论文
源URL	[http://ir.lut.edu.cn/handle/2XXMBERH/115542]
专题	材料科学与工程学院
作者单位	1.College of Physics and Optoelectronics, Taiyuan University of Technology, Taiyuan; 030024, China; 2.Key Laboratory of Marine Materials and Related Technologies, Zhejiang Key Laboratory of Marine Materials and Protective Technologies, Ningbo Institute of Materials Technology and Engineering, Chinese Academy of Sciences, Ningbo; 315201, China; 3.University of Chinese Academy of Sciences, Beijing; 100039, China; 4.State Key Laboratory of Advanced Processing and Recycling of Nonferrous Metals, Lanzhou University of Technology, Lanzhou; 730050, China
推荐引用方式 GB/T 7714	Cheng, Li,Shi, Yanbin,Hao, Yu,et al. Multilayer boron nitride nanofilm as an effective barrier for atomic oxygen irradiation[J]. Applied Surface Science,2020,504.
APA	Cheng, Li,Shi, Yanbin,Hao, Yu,Li, Wensheng,Ren, Siming,&Wang, Liping.(2020).Multilayer boron nitride nanofilm as an effective barrier for atomic oxygen irradiation.Applied Surface Science,504.
MLA	Cheng, Li,et al."Multilayer boron nitride nanofilm as an effective barrier for atomic oxygen irradiation".Applied Surface Science 504(2020).