Temperature distribution for laser etching of metal thin films on polyimide substrate

doi:10.3788/CJL201643.0503009

CORC > 兰州理工大学 > 兰州理工大学 > 省部共建有色金属先进加工与再利用国家重点实验室

	Temperature distribution for laser etching of metal thin films on polyimide substrate
	Zhang, Hongwei 2; Ren, Ni 1; Xue, Hongtao 2; Tang, Fuling 2; Yan, Xiaodong 2; Lu, Wenjiang 2; Liu, Xiaoli 1
刊名	Zhongguo Jiguang/Chinese Journal of Lasers
	2016-05-10
卷号	43 期号:5
关键词	Ablation Composite films Copper Etching Irradiation Laser beam effects Metallic films Polyimides Temperature distribution Thin films Ablation depth Laser etching Laser technique Metal thin film Pulse laser
ISSN号	02587025
DOI	10.3788/CJL201643.0503009
英文摘要	In order to study the pulse laser etching process of metal thin films on polyimide substrate, a two-dimensional transient physical model of Gaussian distribution pulse laser irradiation in composite material is established with the finite element analysis software COMSOL Multiphysics. The temperature distribution of metal thin films is calculated under irradiation of pulse lasers with different powers by means of solving the thermal conduction equations. The influences of different laser parameters on etching process are discussed. Simulation results show that the ablation depth is mainly affected by the laser power density, and it decreases at first and then keeps constant with increase of metal film's thickness. During the etching process, it is appropriate to choose laser parameters of higher power and shorter pulse width in order to well protect the substrate from damage. As copper film etching is much more difficult than aluminum film etching, higher laser power density should be selected for copper film etching. Results are instructive and helpful to understand the actual laser etching process. © 2016, Chinese Lasers Press. All right reserved.
语种	中文
出版者	Science Press
内容类型	期刊论文
源URL	[http://ir.lut.edu.cn/handle/2XXMBERH/112612]
专题	省部共建有色金属先进加工与再利用国家重点实验室材料科学与工程学院
作者单位	1.National Key Laboratory of Vacuum and Cryogenic Technology on Physics, Lanzhou Institute of Physics, Lanzhou; Gansu; 730000, China 2.School of Material Science and Engineering, Lanzhou University of Technology, Lanzhou; Gansu; 730050, China;
推荐引用方式 GB/T 7714	Zhang, Hongwei,Ren, Ni,Xue, Hongtao,et al. Temperature distribution for laser etching of metal thin films on polyimide substrate[J]. Zhongguo Jiguang/Chinese Journal of Lasers,2016,43(5).
APA	Zhang, Hongwei.,Ren, Ni.,Xue, Hongtao.,Tang, Fuling.,Yan, Xiaodong.,...&Liu, Xiaoli.(2016).Temperature distribution for laser etching of metal thin films on polyimide substrate.Zhongguo Jiguang/Chinese Journal of Lasers,43(5).
MLA	Zhang, Hongwei,et al."Temperature distribution for laser etching of metal thin films on polyimide substrate".Zhongguo Jiguang/Chinese Journal of Lasers 43.5(2016).