Thermal stability of tungsten sub-nitride thin film prepared by reactive magnetron sputtering

doi:10.1016/j.jnucmat.2016.12.009

CORC > 兰州理工大学 > 兰州理工大学 > 石油化工学院

	Thermal stability of tungsten sub-nitride thin film prepared by reactive magnetron sputtering
	Zhang, X. X.1,2; Wu, Y. Z.2; Mu, B.3; Qiao, L.1; Li, W. X.4; Li, J. J.4; Wang, P.1
刊名	JOURNAL OF NUCLEAR MATERIALS
	2017-03
卷号	485 页码:1-7
关键词	Magnetron sputtering Tungsten sub-nitride Thermal stability Structure Annealing Thermal desorption spectroscopy
ISSN号	0022-3115
DOI	10.1016/j.jnucmat.2016.12.009
英文摘要	Tungsten sub-nitride thin films deposited on silicon samples by reactive magnetron sputtering were used as a model system to study the phase stability and microstructural evolution during thermal treatments. XRD, SEM&FIB, XPS, RBS and TDS were applied to investigate the stability of tungsten nitride films after heating up to 1473 K in vacuum. At the given experimental parameters a 920 nm thick crystalline film with a tungsten and nitrogen stoichiometry of 2:1 were achieved. The results showed that no phase and microstructure change occurred due to W2N film annealing in vacuum up to 973 K. Heating up to 1073 K led to a partial decomposition of the W2N phase and the formation of a W enrichment layer at the surface. Increasing the annealing time at the same temperature, the further decomposition of the W2N phase was negligible. The complete decomposition of W2N film happened as the temperature reached up to 1473 K. (C) 2017 Elsevier B.V. All rights reserved.
资助项目	National Natural Science Foundation of China[11475236]
WOS研究方向	Materials Science ; Nuclear Science & Technology
语种	英语
出版者	ELSEVIER SCIENCE BV
WOS记录号	WOS:000394079200001
状态	已发表
内容类型	期刊论文
源URL	[http://119.78.100.223/handle/2XXMBERH/33349]
专题	石油化工学院材料科学与工程学院
通讯作者	Wu, Y. Z.; Wang, P.
作者单位	1.Chinese Acad Sci, Lanzhou Inst Chem Phys, State Key Lab Solid Lubricat, Lanzhou 730050, Peoples R China 2.Lanzhou Univ Technol, Sch Mat Sci & Engn, Lanzhou 730050, Peoples R China 3.Lanzhou Univ Technol, Coll Petrochem Technol, Lanzhou 730050, Peoples R China 4.Chinese Acad Sci, Beijing Natl Lab Condensed Matter Phys, Inst Phys, Beijing 100190, Peoples R China
推荐引用方式 GB/T 7714	Zhang, X. X.,Wu, Y. Z.,Mu, B.,et al. Thermal stability of tungsten sub-nitride thin film prepared by reactive magnetron sputtering[J]. JOURNAL OF NUCLEAR MATERIALS,2017,485:1-7.
APA	Zhang, X. X..,Wu, Y. Z..,Mu, B..,Qiao, L..,Li, W. X..,...&Wang, P..(2017).Thermal stability of tungsten sub-nitride thin film prepared by reactive magnetron sputtering.JOURNAL OF NUCLEAR MATERIALS,485,1-7.
MLA	Zhang, X. X.,et al."Thermal stability of tungsten sub-nitride thin film prepared by reactive magnetron sputtering".JOURNAL OF NUCLEAR MATERIALS 485(2017):1-7.