High-birefringence waveguide Bragg gratings fabricated in a silica-on-silicon platform with displacement Talbot lithography | |
X. C. Luo,C. Chen,L. Qin,X. Zhang,Y. Y. Chen,B. Wang,L. Liang,P. Jia,Y. Q. Ning and L. J. Wang | |
刊名 | Optical Materials Express |
2020 | |
卷号 | 10期号:10页码:2406-2414 |
ISSN号 | 2159-3930 |
DOI | 10.1364/ome.402937 |
英文摘要 | High-birefringence waveguide Bragg gratings for the C-band are fabricated in the Silica-on-Silicon platform with Displacement Talbot Lithography (DTL). Transmission and reflection spectrums of the Bragg wavelength splitting were measured and calculated. The birefringence here is up to 7.919x10(-4) to 1.670x10(-3), much higher than existing devices via other platforms. We illustrate the principle and advantage of DTL though theoretical analysis and numerical simulation. The birefringence of waveguide Bragg gratings here are customized with their device configuration (i.e., waveguide width and grating etched depth), enabling an effective method to construct scalable Silica-on-Silicon devices for highly linear-polarized external-cavity semiconductor lasers. (C) 2020 Optical Society of America under the terms of the OSA Open Access Publishing Agreement |
URL标识 | 查看原文 |
语种 | 英语 |
内容类型 | 期刊论文 |
源URL | [http://ir.ciomp.ac.cn/handle/181722/64558] |
专题 | 中国科学院长春光学精密机械与物理研究所 |
推荐引用方式 GB/T 7714 | X. C. Luo,C. Chen,L. Qin,X. Zhang,Y. Y. Chen,B. Wang,L. Liang,P. Jia,Y. Q. Ning and L. J. Wang. High-birefringence waveguide Bragg gratings fabricated in a silica-on-silicon platform with displacement Talbot lithography[J]. Optical Materials Express,2020,10(10):2406-2414. |
APA | X. C. Luo,C. Chen,L. Qin,X. Zhang,Y. Y. Chen,B. Wang,L. Liang,P. Jia,Y. Q. Ning and L. J. Wang.(2020).High-birefringence waveguide Bragg gratings fabricated in a silica-on-silicon platform with displacement Talbot lithography.Optical Materials Express,10(10),2406-2414. |
MLA | X. C. Luo,C. Chen,L. Qin,X. Zhang,Y. Y. Chen,B. Wang,L. Liang,P. Jia,Y. Q. Ning and L. J. Wang."High-birefringence waveguide Bragg gratings fabricated in a silica-on-silicon platform with displacement Talbot lithography".Optical Materials Express 10.10(2020):2406-2414. |
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