Illumination uniformity improvement in digital micromirror device based scanning photolithography system

doi:10.1364/oe.26.018597

CORC > 长春光学精密机械与物理研究所 > 中国科学院长春光学精密机械与物理研究所

	Illumination uniformity improvement in digital micromirror device based scanning photolithography system
	Xiong, Z.; Liu, H.; Chen, R. H.; Xu, J.; Li, Q. K.; Li, J. H.; Zhang, W. J.
刊名	Optics Express
	2018
卷号	26 期号:14 页码:18597-18607
关键词	maskless lithography dmd fabrication elements Optics
ISSN号	1094-4087
DOI	10.1364/oe.26.018597
英文摘要	Illumination uniformity in photolithography systems determines the dimensional difference across the entire lithographic substrate. However, traditional lithography system relies on expensive and complex illumination system for achieving uniform illumination. In this paper, we propose a simple and cost-effective method based on the modulation of digital micromirror device to improve illumination uniformity. The modulation according to a digital mask achieved via an iteration program improves the uniformity to be above 95%. We demonstrate the effectiveness of the method by experimentally fabricating a linear grating. By implementing this method, the maximum dimensional difference is decreased from 3.3 mu m to 0.3 mu m. Further simulations indicate that higher uniformity is achievable once the field of view on the DMD is divided into smaller subregions. (C) 2018 Optical Society of America under the terms of the OSA Open Access Publishing Agreement
内容类型	期刊论文
源URL	[http://ir.ciomp.ac.cn/handle/181722/61025]
专题	中国科学院长春光学精密机械与物理研究所
推荐引用方式 GB/T 7714	Xiong, Z.,Liu, H.,Chen, R. H.,et al. Illumination uniformity improvement in digital micromirror device based scanning photolithography system[J]. Optics Express,2018,26(14):18597-18607.
APA	Xiong, Z..,Liu, H..,Chen, R. H..,Xu, J..,Li, Q. K..,...&Zhang, W. J..(2018).Illumination uniformity improvement in digital micromirror device based scanning photolithography system.Optics Express,26(14),18597-18607.
MLA	Xiong, Z.,et al."Illumination uniformity improvement in digital micromirror device based scanning photolithography system".Optics Express 26.14(2018):18597-18607.