Performance Investigation of Multilayer MoS2 Thin-Film Transistors Fabricated via Mask-free Optically Induced Electrodeposition | |
Li M(李萌); Liu N(刘娜); Li P(李盼); Shi JL(施佳林); Li GY(李广勇); Wang YC(王越超); Liu LQ(刘连庆) | |
刊名 | ACS Applied Materials and Interfaces
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2017 | |
卷号 | 9期号:9页码:8361-8370 |
关键词 | Mask-free Fabrication Metal-contact Surface Multilayer Mos2 Thickness Of Mos2 Film Thin-film Transistors |
ISSN号 | 1944-8244 |
产权排序 | 1 |
英文摘要 | Transition metal dichalcogenides, particularly MoS2, have recently received enormous interest in explorations of the physics and technology of nanodevice applications because of their excellent optical and electronic properties. Although monolayer MoS2has been extensively investigated for various possible applications, its difficulty of fabrication renders it less appealing than multilayer MoS2. Moreover, multilayer MoS2, with its inherent high electronic/photonic state densities, has higher output driving capabilities and can better satisfy the ever-increasing demand for versatile devices. Here, we present multilayer MoS2back-gate thin-film transistors (TFTs) that can achieve a relatively low subthreshold swing of 0.75 V/decade and a high mobility of 41 cm2·V-1·s-1, which exceeds the typical mobility value of state-of-the-art amorphous silicon-based TFTs by a factor of 80. Ag and Au electrode-based MoS2TFTs were fabricated by a convenient and rapid process. Then we performed a detailed analysis of the impacts of metal contacts and MoS2film thickness on electronic performance. Our findings show that smoother metal contacts exhibit better electronic characteristics and that MoS2film thickness should be controlled within a reasonable range of 30-40 nm to obtain the best mobility values, thereby providing valuable insights regarding performance enhancement for MoS2TFTs. Additionally, to overcome the limitations of the conventional fabrication method, we employed a novel approach known as optically induced electrodeposition (OIE), which allows the flexible and precise patterning of metal films and enables rapid and mask-free device fabrication, for TFT fabrication. |
WOS关键词 | Field-effect Transistors ; Single-layer Mos2 ; Monolayer Mos2 ; Cvd Mos2 ; Graphene ; Phototransistors ; Contacts ; Interface ; Arrays |
WOS研究方向 | Science & Technology - Other Topics ; Materials Science |
语种 | 英语 |
WOS记录号 | WOS:000396186000056 |
资助机构 | NSFC/RGC Joint Research Scheme (Project 51461165501, Project CityU132/14), National Natural Science Foundation of China (Project 61522312), and the CAS FEA International Partnership Program for Creative Research Teams. |
内容类型 | 期刊论文 |
源URL | [http://ir.sia.cn/handle/173321/20244] ![]() |
专题 | 沈阳自动化研究所_机器人学研究室 |
作者单位 | 1.State Key Laboratory of Robotics, Shenyang Institute of Automation, Chinese Academy of Sciences, Shenyang 110016, China 2.University of the Chinese Academy of Sciences, Beijing 100049, China 3.School of Mechatronics Engineering and Automation, Shanghai University, Shanghai 200072, China 4.University of Pittsburgh, Pittsburgh, PA, 15260, United States 5.Emerging Technologies Institute, Department of Industrial & Manufacturing Systems Engineering, University of Hong Kong, Pokfulam, Hong Kong |
推荐引用方式 GB/T 7714 | Li M,Liu N,Li P,et al. Performance Investigation of Multilayer MoS2 Thin-Film Transistors Fabricated via Mask-free Optically Induced Electrodeposition[J]. ACS Applied Materials and Interfaces,2017,9(9):8361-8370. |
APA | Li M.,Liu N.,Li P.,Shi JL.,Li GY.,...&Liu LQ.(2017).Performance Investigation of Multilayer MoS2 Thin-Film Transistors Fabricated via Mask-free Optically Induced Electrodeposition.ACS Applied Materials and Interfaces,9(9),8361-8370. |
MLA | Li M,et al."Performance Investigation of Multilayer MoS2 Thin-Film Transistors Fabricated via Mask-free Optically Induced Electrodeposition".ACS Applied Materials and Interfaces 9.9(2017):8361-8370. |
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