| Highly Polarized Photoelectrical Response in vdW ZrS 3 Nanoribbons | |
| Xiaoting Wang; Kedi Wu; Mark Blei; Yang Wang; Longfei Pan; Kai Zhao; Chongxin Shan; Ming Lei; Yu Cui; Bin Chen; David Wright; Weida Hu; Sefaattin Tongay; Zhongming Wei | |
| 刊名 | Advanced Electronic Materials
 |
| 2019 | |
| 卷号 | 5期号:7页码:1900419 |
| 内容类型 | 期刊论文 |
| 源URL | [http://ir.semi.ac.cn/handle/172111/29432]  |
| 专题 | 半导体研究所_半导体超晶格国家重点实验室 |
| 通讯作者 | Xiaoting Wang; Kedi Wu; Mark Blei; Yang Wang; Longfei Pan; Kai Zhao; Chongxin Shan; Ming Lei; Yu Cui; Bin Chen; David Wright; Weida Hu; Sefaattin Tongay; Zhongming Wei |
| 推荐引用方式 GB/T 7714 | Xiaoting Wang; Kedi Wu; Mark Blei; Yang Wang; Longfei Pan; Kai Zhao; Chongxin Shan; Ming Lei; Yu Cui; Bin Chen; David Wright; Weida Hu; Sefaattin Tongay; Zhongming Wei. Highly Polarized Photoelectrical Response in vdW ZrS 3 Nanoribbons[J]. Advanced Electronic Materials,2019,5(7):1900419. |
| APA | Xiaoting Wang; Kedi Wu; Mark Blei; Yang Wang; Longfei Pan; Kai Zhao; Chongxin Shan; Ming Lei; Yu Cui; Bin Chen; David Wright; Weida Hu; Sefaattin Tongay; Zhongming Wei.(2019).Highly Polarized Photoelectrical Response in vdW ZrS 3 Nanoribbons.Advanced Electronic Materials,5(7),1900419. |
| MLA | Xiaoting Wang; Kedi Wu; Mark Blei; Yang Wang; Longfei Pan; Kai Zhao; Chongxin Shan; Ming Lei; Yu Cui; Bin Chen; David Wright; Weida Hu; Sefaattin Tongay; Zhongming Wei."Highly Polarized Photoelectrical Response in vdW ZrS 3 Nanoribbons".Advanced Electronic Materials 5.7(2019):1900419. |
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