Fast-sweeping Langmuir probes: what happens to the I -V trace when sweeping frequency is higher than the ion plasma frequency?

doi:10.1088/2058-6272/ac41c0

	Fast-sweeping Langmuir probes: what happens to the I -V trace when sweeping frequency is higher than the ion plasma frequency?
	Jin, Chenyao 1,2; Yip, Chi-shung 1; Zhang, Wei 1; Jiang, Di 1; Xu, Guosheng 1
刊名	PLASMA SCIENCE & TECHNOLOGY
	2022-02-01
卷号	24
关键词	high speed diagnostics time resolved diagnostics Langmuir probe
ISSN号	1009-0630
DOI	10.1088/2058-6272/ac41c0
通讯作者	Yip, Chi-shung(csyip@ipp.ac.cn) ; Zhang, Wei(zhangwei@ipp.ac.cn)
英文摘要	Limited particle transit time is one of several limiting factors which determine the maximum temporal resolution of a Langmuir probe. In this work, we have revisited the known fast sweep Langmuir probe techniques in a uniform, quiescent multi-dipole confined hot cathode discharge with two operation scenarios: one in which the probe sweeping frequency f (sweep) is much lower than the ion plasma frequency f (pi), another one where f (sweep) is much greater than f (pi), respectively. This allows investigation into the effect of limited ion-motion on I-V traces. Serious distortions of I-V traces at high frequencies, previously claimed to be an ion-motion limitation effect, were not found unless shunt resistance is sufficiently high, despite a f (sweep)/f (pi) ratio of similar to 3. On the other hand, evidences of sheath capacitance on the I-V traces have been observed. Distortions of I-V traces qualitatively agree with predictions of sheath capacitance response to the sweeping voltage. Additionally, techniques in fast sweep Langmuir probe are briefly discussed. The comparison between the high-speed dual Langmuir probe (HDLP) and the single probe setup shows that the capacitive response can be removed via subtracting a leakage current for the single probe setup almost as effectively as using the HDLP setup, but the HDLP setup does remain advantageous in its facilitation of better recovery of weak current signal commonly in low density plasma.
资助项目	National Natural Science Foundation of China[11875285] ; CAS Key Research Program of Frontier Sciences[QYZDB-SSW-SLH001] ; Chinese Academy of Science Hundred Youth Talent Program
WOS关键词	SHEATH ; KHZ
WOS研究方向	Physics
语种	英语
出版者	IOP Publishing Ltd
WOS记录号	WOS:000756012200001
资助机构	National Natural Science Foundation of China ; CAS Key Research Program of Frontier Sciences ; Chinese Academy of Science Hundred Youth Talent Program
内容类型	期刊论文
源URL	[http://ir.hfcas.ac.cn:8080/handle/334002/127673]
专题	中国科学院合肥物质科学研究院
通讯作者	Yip, Chi-shung; Zhang, Wei
作者单位	1.Chinese Acad Sci, Inst Plasma Phys, Hefei Inst Phys Sci, Hefei 230031, Peoples R China 2.Univ Sci & Technol China, Hefei 230026, Peoples R China
推荐引用方式 GB/T 7714	Jin, Chenyao,Yip, Chi-shung,Zhang, Wei,et al. Fast-sweeping Langmuir probes: what happens to the I -V trace when sweeping frequency is higher than the ion plasma frequency?[J]. PLASMA SCIENCE & TECHNOLOGY,2022,24.
APA	Jin, Chenyao,Yip, Chi-shung,Zhang, Wei,Jiang, Di,&Xu, Guosheng.(2022).Fast-sweeping Langmuir probes: what happens to the I -V trace when sweeping frequency is higher than the ion plasma frequency?.PLASMA SCIENCE & TECHNOLOGY,24.
MLA	Jin, Chenyao,et al."Fast-sweeping Langmuir probes: what happens to the I -V trace when sweeping frequency is higher than the ion plasma frequency?".PLASMA SCIENCE & TECHNOLOGY 24(2022).