Nanofabrication of 50 nm zone plates through e-beam lithography with local proximity effect correction for x-ray imaging

doi:10.1088/1674-1056/ab7800

CORC > 上海应用物理研究所 > 中国科学院上海应用物理研究所 > 中科院上海应用物理研究所2011-2017年

	Nanofabrication of 50 nm zone plates through e-beam lithography with local proximity effect correction for x-ray imaging
	Zhu, JY ; Zhang, SC ; Xie, SS ; Xu, C ; Zhang, LJ ; Tao, XL ; Ren, YQ ; Wang, YD ; Deng, B ; Tai, RZ
刊名	CHINESE PHYSICS B
	2020
卷号	29 期号:4 页码:-
ISSN号	1674-1056
DOI	10.1088/1674-1056/ab7800
文献子类	期刊论文
英文摘要	High resolution Fresnel zone plates for nanoscale three-dimensional imaging of materials by both soft and hard x-rays are increasingly needed by the broad applications in nanoscience and nanotechnology. When the outmost zone-width is shrinking down to 50 nm or even below, patterning the zone plates with high aspect ratio by electron beam lithography still remains a challenge because of the proximity effect. The uneven charge distribution in the exposed resist is still frequently observed even after standard proximity effect correction (PEC), because of the large variety in the line width. This work develops a new strategy, nicknamed as local proximity effect correction (LPEC), efficiently modifying the deposited energy over the whole zone plate on the top of proximity effect correction. By this way, 50 nm zone plates with the aspect ratio from 4 : 1 up to 15 : 1 and the duty cycle close to 0.5 have been fabricated. Their imaging capability in soft (1.3 keV) and hard (9 keV) x-ray, respectively, has been demonstrated in Shanghai Synchrotron Radiation Facility (SSRF) with the resolution of 50 nm. The local proximity effect correction developed in this work should also be generally significant for the generation of zone plates with high resolutions beyond 50 nm.
语种	英语
内容类型	期刊论文
源URL	[http://ir.sinap.ac.cn/handle/331007/33026]
专题	上海应用物理研究所_中科院上海应用物理研究所2011-2017年
作者单位	1.Fudan Univ, Sch Informat Sci & Engn, State Key Lab Asic & Syst, Nanolithog & Applicat Res Grp, Shanghai 200433, Peoples R China 2.Chinese Acad Sci, Shanghai Inst Appl Phys, Shanghai Synchrotron Radiat Facil, Shanghai 201204, Peoples R China
推荐引用方式 GB/T 7714	Zhu, JY,Zhang, SC,Xie, SS,et al. Nanofabrication of 50 nm zone plates through e-beam lithography with local proximity effect correction for x-ray imaging[J]. CHINESE PHYSICS B,2020,29(4):-.
APA	Zhu, JY.,Zhang, SC.,Xie, SS.,Xu, C.,Zhang, LJ.,...&Chen, YF.(2020).Nanofabrication of 50 nm zone plates through e-beam lithography with local proximity effect correction for x-ray imaging.CHINESE PHYSICS B,29(4),-.
MLA	Zhu, JY,et al."Nanofabrication of 50 nm zone plates through e-beam lithography with local proximity effect correction for x-ray imaging".CHINESE PHYSICS B 29.4(2020):-.