Nanofabrication of 30 nm Au zone plates by e-beam lithography and pulse voltage electroplating for soft x-ray imaging

doi:10.1016/j.mee.2020.111254

CORC > 上海应用物理研究所 > 中国科学院上海应用物理研究所 > 中科院上海应用物理研究所2011-2017年

	Nanofabrication of 30 nm Au zone plates by e-beam lithography and pulse voltage electroplating for soft x-ray imaging
	Zhu, JY ; Chen, YF ; Xie, SS ; Zhang, LJ ; Wang, CP ; Tai, RZ
刊名	MICROELECTRONIC ENGINEERING
	2020
卷号	225 页码:-
ISSN号	0167-9317
DOI	10.1016/j.mee.2020.111254
文献子类	期刊论文
英文摘要	High resolution Fresnel zone plates for nanoscale 3D imaging of materials by both soft and hard X-ray are growingly needed in broad applications in nanoscience and technology. When the outmost zone-width approaches 30 nm or even below, electro-deposition of gold into narrow trenches replicated by electron beam lithography in resist becomes increasingly difficult. Pulse electroplating instead of conventional direct-current one has been attempted in this work to overcome the problem in the au deposition in narrow trenches. Careful study of the au deposition rate as the function of adjustment parameters including the anodic bias, the pulse frequency and the deposition time has been systematically carried out. The optimized window of the parameters is adopted in the fabrication of 30 nm zone plates with the aspect ratio from 3:1 up to 7:1 and the duty cycle close to 0.5. Imaging of in-house made Siemens stars with 30 nm as the narrowest line-width has been successfully demonstrated in soft X-ray (706 eV). The origin of electroforming of well-structured au zones by pulse electroplating is discussed
语种	英语
内容类型	期刊论文
源URL	[http://ir.sinap.ac.cn/handle/331007/33025]
专题	上海应用物理研究所_中科院上海应用物理研究所2011-2017年
作者单位	1.Fudan Univ, Sch Informat Sci & Engn, State Key Lab Asic & Syst, Nanolithog & Applicat Res Grp, Shanghai 200433, Peoples R China 2.Chinese Acad Sci, Shanghai Inst Appl Phys, Shanghai Synchrotron Radiat Facil, Shanghai 201204, Peoples R China
推荐引用方式 GB/T 7714	Zhu, JY,Chen, YF,Xie, SS,et al. Nanofabrication of 30 nm Au zone plates by e-beam lithography and pulse voltage electroplating for soft x-ray imaging[J]. MICROELECTRONIC ENGINEERING,2020,225:-.
APA	Zhu, JY,Chen, YF,Xie, SS,Zhang, LJ,Wang, CP,&Tai, RZ.(2020).Nanofabrication of 30 nm Au zone plates by e-beam lithography and pulse voltage electroplating for soft x-ray imaging.MICROELECTRONIC ENGINEERING,225,-.
MLA	Zhu, JY,et al."Nanofabrication of 30 nm Au zone plates by e-beam lithography and pulse voltage electroplating for soft x-ray imaging".MICROELECTRONIC ENGINEERING 225(2020):-.