DNA Origami Radiometers for Measuring Ultraviolet Exposure
Fang, WN; Xie, M; Hou, XL; Liu, XG; Zuo, XL; Chao, J; Wang, LH; Fan, CH; Liu, HJ; Wang, LH
刊名JOURNAL OF THE AMERICAN CHEMICAL SOCIETY
2020
卷号142期号:19页码:8782-8789
关键词UV NANOSTRUCTURES DAMAGE RADIATION STABILITY CANCER
ISSN号0002-7863
DOI10.1021/jacs.0c01254
文献子类期刊论文
英文摘要Ultraviolet (UV) light has long been known to damage nucleic acids. In this work, a DNA origami radiometer has been developed for measuring UV exposure by monitoring the morphological evolution of DNA origami nanostructures. Unlike linear DNA strands that tend to be degraded into small segments upon UV exposure, the structural complexity and interstrand connectivity of DNA origami remarkably alter the pathway of UV-induced DNA damage. A general pathway of expansion, distortion, and final disintegration is observed for DNA origami regardless of their shape and size; however the deformation kinetics is positively correlated with the number of nicks in the nanostructure. This structural continuity-dependent deformation can be translated into a DNA-based radiometer for measuring UV dose in the environment.
语种英语
内容类型期刊论文
源URL[http://ir.sinap.ac.cn/handle/331007/32809]  
专题上海应用物理研究所_中科院上海应用物理研究所2011-2017年
作者单位1.Chinese Acad Sci, Shanghai Adv Res Inst, Zhangjiang Lab, Shanghai Synchrotron Radiat Facil, Shanghai 201800, Peoples R China
2.Shanghai Jiao Tong Univ, Renji Hosp, Sch Med, Inst Mol Med,Shanghai Key Lab Nucle Acids Chem &, Shanghai 200240, Peoples R China
3.Shanghai Jiao Tong Univ, Frontiers Sci Ctr Transformat Mol, Sch Chem & Chem Engn, Shanghai 200240, Peoples R China
4.Nanjing Univ Posts & Telecommun, Inst Adv Mat IAM, Key Lab Organ Elect & Informat Displays KLOEID, Nanjing 210046, Peoples R China
5.Nanjing Univ Posts & Telecommun, Sch Mat Sci & Engn, Nanjing 210046, Peoples R China
6.Tongji Univ, Sch Chem Sci & Engn, Key Lab Adv Civil Engn Mat,Minist Educ, Shanghai Res Inst Intelligent Autonomous Syst, Shanghai 200092, Peoples R China
7.Chinese Acad Sci, Shanghai Inst Appl Phys, Div Phys Biol, Shanghai 201800, Peoples R China
推荐引用方式
GB/T 7714
Fang, WN,Xie, M,Hou, XL,et al. DNA Origami Radiometers for Measuring Ultraviolet Exposure[J]. JOURNAL OF THE AMERICAN CHEMICAL SOCIETY,2020,142(19):8782-8789.
APA Fang, WN.,Xie, M.,Hou, XL.,Liu, XG.,Zuo, XL.,...&Wang, LH.(2020).DNA Origami Radiometers for Measuring Ultraviolet Exposure.JOURNAL OF THE AMERICAN CHEMICAL SOCIETY,142(19),8782-8789.
MLA Fang, WN,et al."DNA Origami Radiometers for Measuring Ultraviolet Exposure".JOURNAL OF THE AMERICAN CHEMICAL SOCIETY 142.19(2020):8782-8789.
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