Defect Removal by Solvent Vapor Annealing in Thin Films of Lamellar Diblock Copolymers

doi:10.1021/acs.macromol.9b01181

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	Defect Removal by Solvent Vapor Annealing in Thin Films of Lamellar Diblock Copolymers
	Xu, Xinpeng 4; Man, Xingkun 5,6; Doi, Masao 5,6; Ou-Yang, Zhong-can ; Andelman, David 1
刊名	MACROMOLECULES
	2019
卷号	52 期号:23 页码:9321-9333
关键词	BLOCK POLYMER-SOLUTIONS PHASE-SEPARATION DILUTION APPROXIMATION ORDERED STRUCTURE ANNIHILATION ORIENTATION EVAPORATION SIMULATION DYNAMICS KINETICS
ISSN号	0024-9297
DOI	10.1021/acs.macromol.9b01181
英文摘要	Solvent vapor annealing (SVA) is known to be a simple, low-cost, and highly efficient technique to produce defect-free diblock copolymer (BCP) thin films. Not only can the solvent weaken the BCP segmental interactions but it can also vary the characteristic spacing of the BCP microstructures. We carry out systematic theoretical studies on the effect of adding a solvent into lamellar BCP thin films on the defect removal close to the BCP order-disorder transition. We find that the increase of the lamellar spacing, as is induced by addition of the solvent, facilitates more efficient removal of defects. The stability of a particular defect in a lamellar BCP thin film is given in terms of two key controllable parameters: the amount of BCP swelling and the solvent-evaporation rate. Our results highlight the SVA mechanism for obtaining defect-free BCP thin films, as is highly desired in nanolithography and other industrial applications.
学科主题	Polymer Science
语种	英语
内容类型	期刊论文
源URL	[http://ir.itp.ac.cn/handle/311006/26954]
专题	理论物理研究所_理论物理所1978-2010年知识产出
作者单位	1.Chinese Acad Sci, Inst Theoret Phys, CAS Key Lab Theoret Phys, Beijing 100190, Peoples R China 2.Tel Aviv Univ, Raymond & Beverly Sadder Sch Phys & Astron, IL-69978 Tel Aviv, Israel 3.Beihang Univ, Sch Phys & Nucl Energy Engn, Beijing 100191, Peoples R China 4.Guangdong Technion Israel Inst Technol, Phys Program, Shantou 515063, Guangdong, Peoples R China 5.Technion Israel Inst Technol, IL-32000 Haifa, Israel 6.Beihang Univ, Ctr Soft Matter Phys & Its Applicat, Beijing 100191, Peoples R China
推荐引用方式 GB/T 7714	Xu, Xinpeng,Man, Xingkun,Doi, Masao,et al. Defect Removal by Solvent Vapor Annealing in Thin Films of Lamellar Diblock Copolymers[J]. MACROMOLECULES,2019,52(23):9321-9333.
APA	Xu, Xinpeng,Man, Xingkun,Doi, Masao,Ou-Yang, Zhong-can,&Andelman, David.(2019).Defect Removal by Solvent Vapor Annealing in Thin Films of Lamellar Diblock Copolymers.MACROMOLECULES,52(23),9321-9333.
MLA	Xu, Xinpeng,et al."Defect Removal by Solvent Vapor Annealing in Thin Films of Lamellar Diblock Copolymers".MACROMOLECULES 52.23(2019):9321-9333.