Influence of modulation period on structure and mechanical properties of WB2/CrN films deposited by direct-current magnetron sputtering

doi:10.1016/j.jallcom.2019.02.188

CORC > 金属研究所 > 中国科学院金属研究所

	Influence of modulation period on structure and mechanical properties of WB2/CrN films deposited by direct-current magnetron sputtering
	Liu, Yanming 1; Shi, Wenbo 2,3; Tian, Li 1; Li, Tong 1; Wang, Chen 1; Liu, Feng 1; Pei, Zhiliang 2; Fan, Di 2
刊名	JOURNAL OF ALLOYS AND COMPOUNDS
	2019-06-05
卷号	788 页码:729-738
关键词	Magnetron sputtering WB2/CrN multilayers Thick modulation period Mechanical properties
ISSN号	0925-8388
DOI	10.1016/j.jallcom.2019.02.188
通讯作者	Pei, Zhiliang(zlpei@imr.ac.cn) ; Fan, Di(dfan11s@alum.imr.ac.cn)
英文摘要	WB2/CrN multilayer films with thick modulation periods over 50 nm (Lambda = 1400, 315, 235, 150, 55 nm) were synthesized by direct-current magnetron sputtering, and the influence of modulation period on microstructure and mechanical properties for the multilayer films was systematically studied. In WB2/CrN multilayer films, CrN sublayers present the columnar microstructure. As L decreases, the structure of WB2 sublayers evolves from (110) orientation to (001) orientation to amorphous structure, and critical crystalline thickness for WB2 sublayers is over 150 nm here. A transition layer, which shows the columnar crystal with size of 10-11 nm high and 2.5-3.5 nm wide caused by the effect of the crystalline interface of the CrN sublayers, is detected in WB2 sublayers. Additionally, a-BN, WB2, WB2(N), CrN, Cr2N and Cr2O3 phase are formed in the multilayer films. Moreover, film hardness mainly obeys the rule of mixture. The maximum hardness of 31.2 GPa is obtained at Lambda = 315 nm due to crystalline WB2 sublayers with (001) preferred orientation, and amorphous WB2 sublayers greatly reduce the film hardness to only 22.3-24.3 GPa at Lambda < 235 nm. Consequently, the poor hardness leads to the higher wear rates (5.7-7.8 x 10(-7) mm(3)/mN) of multilayer films with Lambda <= 235 nm compared with those (2.9-3.3 x 10(-7) mm(3)/mN) of other films. However, both the fracture toughness and adhesive strength of the films present an increasing trend with decreasing Lambda, resulting from the soft CrN and BN phases and a certain amount of interface. In conclusion, decreasing the critical crystal-thickness of the WB2 sublayers, controlling the N content in WB2 sublayers and getting sharp interfaces will play important roles in developing the higher-performance WB2/CrN multilayer films. (C) 2019 Elsevier B.V. All rights reserved.
资助项目	Natural Science Foundation of China[51701157] ; Natural Science Foundation of China[51704239] ; Natural Science Foundation of Shaanxi Province of China[2017JQ5031] ; Natural Science Foundation of Shaanxi Province of China[2017JM5101] ; Natural Science Foundation of Shaanxi Province of China[2018JQ5108]
WOS研究方向	Chemistry ; Materials Science ; Metallurgy & Metallurgical Engineering
语种	英语
出版者	ELSEVIER SCIENCE SA
WOS记录号	WOS:000462767000086
资助机构	Natural Science Foundation of China ; Natural Science Foundation of Shaanxi Province of China
内容类型	期刊论文
源URL	[http://ir.imr.ac.cn/handle/321006/132563]
专题	金属研究所_中国科学院金属研究所
通讯作者	Pei, Zhiliang; Fan, Di
作者单位	1.Xian Shiyou Univ, Coll Mat Sci & Engn, Xian 710065, Shaanxi, Peoples R China 2.Chinese Acad Sci, Inst Met Res, Shenyang 110016, Liaoning, Peoples R China 3.Univ Sci & Technol China, Dept Mat Sci & Engn, Shenyang 110016, Liaoning, Peoples R China
推荐引用方式 GB/T 7714	Liu, Yanming,Shi, Wenbo,Tian, Li,et al. Influence of modulation period on structure and mechanical properties of WB2/CrN films deposited by direct-current magnetron sputtering[J]. JOURNAL OF ALLOYS AND COMPOUNDS,2019,788:729-738.
APA	Liu, Yanming.,Shi, Wenbo.,Tian, Li.,Li, Tong.,Wang, Chen.,...&Fan, Di.(2019).Influence of modulation period on structure and mechanical properties of WB2/CrN films deposited by direct-current magnetron sputtering.JOURNAL OF ALLOYS AND COMPOUNDS,788,729-738.
MLA	Liu, Yanming,et al."Influence of modulation period on structure and mechanical properties of WB2/CrN films deposited by direct-current magnetron sputtering".JOURNAL OF ALLOYS AND COMPOUNDS 788(2019):729-738.