Double-beam laser interference lithography based on optical field modulation

doi:10.1117/12.2510947

CORC > 光电技术研究所 > 中国科学院光电技术研究所 > 微细加工光学技术国家重点实验室（开放室）

	Double-beam laser interference lithography based on optical field modulation
	Peng, Fuping 1,2; Yan, Wei 1; Yang, Fan 1,2; Li, Fanxing 1,2
	2019
会议日期	June 26, 2018 - June 29, 2018
会议地点	Chengdu, China
关键词	interference optical field modulation function
卷号	10842
DOI	10.1117/12.2510947
页码	108421C
英文摘要	In the micro-nano structure manufacturing field, large field of view, flexibility, and single exposure are the advantages of laser interference lithography. However, this method can only produce periodic patterns. In this paper, laser interference lithography and optical field modulation techniques are combined. By adjusting the parameters such as the phase and amplitude of the incident light beam, a light field modulation interference model was constructed to study the relationship between the parameters of the incident light beam and the intensity distribution of the interference light field. We verified the feasibility of the method through simulation. Considering the performance of existing optical modulation devices such as the pixel size of spatial light modulators, we discuss the challenges of this approach and the actual resolution that can be achieved. There is no doubt that this provides a new direction for the preparation of multiscale, variable period micro-nano patterns. © 2019 SPIE.
会议录	Proceedings of SPIE 10842 - 9th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Subdiffraction-limited Plasmonic Lithography and Innovative Manufacturing Technology
会议录出版者	SPIE
文献子类	会议论文
语种	英语
ISSN号	0277-786X
WOS研究方向	Optics
WOS记录号	WOS:000468819800046
WOS关键词	FABRICATION
内容类型	会议论文
源URL	[http://ir.ioe.ac.cn/handle/181551/9624]
专题	光电技术研究所_微细加工光学技术国家重点实验室（开放室）
作者单位	1.State Key Laboratory of Optical Technologies for Microfabrication, Institute of Optics and Electronics, Chinese Academy of Sciences, Chengdu, Sichuan; 610209, China 2.University of Chinese Academy of Sciences, Beijing; 10049, China;
推荐引用方式 GB/T 7714	Peng, Fuping,Yan, Wei,Yang, Fan,et al. Double-beam laser interference lithography based on optical field modulation[C]. 见:. Chengdu, China. June 26, 2018 - June 29, 2018.