Simulation of thermal stress in ion beam sputtered Ta2O5/SiO2 multilayer coatings on different substrates by finite element analysis

doi:10.1016/j.surfcoat.2019.02.004

CORC > 光电技术研究所 > 中国科学院光电技术研究所 > 薄膜光学技术研究室（十一室）

	Simulation of thermal stress in ion beam sputtered Ta2O5/SiO2 multilayer coatings on different substrates by finite element analysis
	Tian, Xiaoxi 1,2; Xiong, Shengming 1; Zhang, Yinhua 1,2; Zhang, Kepeng 1,2
刊名	Surface and Coatings Technology
	2019-03-25
卷号	362 页码:225-233
关键词	Thermal stress Shear stress Peeling stress FEA Delamination
ISSN号	0257-8972
DOI	10.1016/j.surfcoat.2019.02.004
文献子类	期刊论文
英文摘要	The delamination and failure of thin-film system induced by thermal stress have long been of interest in processes of coatings deposition. In spite of ion beam sputtering depositing (IBSD) exhibiting low processing temperature, the thermal stress still has significant influence when a tremendous difference exists between physical and thermal properties of the bonded materials. Therefore, the investigation for a conventional optical multilayer stack consisting of tantalum pentoxide and silicon dioxide deposited on four substrates with different materials (calcium fluoride, zinc selenide, silicon, and fused silica) in this paper is presented. In order to calculate the thermal stress distribution along thickness remote from the edge, a two-dimensional finite element model of the system is established. Based on this model, the peeling stress and the shear stress at the interfaces between the substrates and coatings are discussed to judge whether the interface delamination is possible, as well as the interfacial peeling moments and interfacial shear forces. Meanwhile, the corresponding samples were coated by the method of IBSD, and the experimental results show excellent agreement with the predictions. Based on the above analyses, we discussed the delamination phenomenon of the experiment, and also proposed some possible approaches to reduce the possibility of the interface delamination. © 2019 Elsevier B.V.
WOS关键词	OXYGEN PARTIAL-PRESSURE ; RESIDUAL-STRESS ; MECHANICAL-PROPERTIES ; MICROSTRUCTURE ; FRACTURE ; FILMS ; DELAMINATION ; GROWTH
WOS研究方向	Materials Science, Coatings & Films ; Physics, Applied
语种	英语
出版者	Elsevier B.V.
WOS记录号	WOS:000461526400028
内容类型	期刊论文
源URL	[http://ir.ioe.ac.cn/handle/181551/9814]
专题	光电技术研究所_薄膜光学技术研究室（十一室）
作者单位	1.Institute of Optics and Electronics, Chinese Academy of Sciences, Chengdu; 610209, China; 2.University of Chinese Academy of Science, Beijing; 100049, China
推荐引用方式 GB/T 7714	Tian, Xiaoxi,Xiong, Shengming,Zhang, Yinhua,et al. Simulation of thermal stress in ion beam sputtered Ta2O5/SiO2 multilayer coatings on different substrates by finite element analysis[J]. Surface and Coatings Technology,2019,362:225-233.
APA	Tian, Xiaoxi,Xiong, Shengming,Zhang, Yinhua,&Zhang, Kepeng.(2019).Simulation of thermal stress in ion beam sputtered Ta2O5/SiO2 multilayer coatings on different substrates by finite element analysis.Surface and Coatings Technology,362,225-233.
MLA	Tian, Xiaoxi,et al."Simulation of thermal stress in ion beam sputtered Ta2O5/SiO2 multilayer coatings on different substrates by finite element analysis".Surface and Coatings Technology 362(2019):225-233.