Optical sectioning microscopy for multilayer structure with micro-scale air gaps measurement

doi:10.1109/LPT.2018.2885140

CORC > 光电技术研究所 > 中国科学院光电技术研究所 > 微电子装备总体研究室（四室）

	Optical sectioning microscopy for multilayer structure with micro-scale air gaps measurement
	Xie, Zhongye 1,2; Tang, Yan 1; Wei, Haojie 1; Liu, Junbo 1; He, Yu 1; Hu, Song 1
刊名	IEEE Photonics Technology Letters
	2019-01-15
卷号	31 期号:2 页码:141-144
关键词	Microscopy surface topography thickness measurement
ISSN号	1041-1135
DOI	10.1109/LPT.2018.2885140
文献子类	期刊论文
英文摘要	In this letter, we propose a new method based on the optical sectioning microscopy to characterize the multilayer structure with micro-scale air gaps. With this technique, sinusoidal fringe patterns having a predefined shifted phase produced by digital micro-mirror devices are illuminated onto the sample. The contrast response curve (CRC) of the reflected patterns along the scanning direction is determined by the phase-shifting algorithm, while the object is scanned through the focus of the microscope. The maximum contrast value of the CRC occurs at the position where the sample is on the focal plane. The peak positions of the CRC are extracted through the Gaussian fitting and then implemented to achieve the surface topography and gap thickness distribution. To suppress the noise influence caused by the environment fluctuations or other factors, the frequency-domain analysis has been introduced in this letter. The simulations and experiments are conducted to verify the feasibility of this technique, demonstrating the potential to be applied in such fields as semiconductor and biochip, where the air gap may play crucial roles. © 1989-2012 IEEE.
WOS研究方向	Engineering, Electrical & Electronic ; Optics ; Physics, Applied
语种	英语
出版者	Institute of Electrical and Electronics Engineers Inc.
WOS记录号	WOS:000456650900008
内容类型	期刊论文
源URL	[http://ir.ioe.ac.cn/handle/181551/9710]
专题	光电技术研究所_微电子装备总体研究室（四室）
作者单位	1.Chinese Academy of Sciences, Institute of Optics and Electronics, Chengdu; 610209, China 2.Department of Materials and Optoelectronics, University of Chinese Academy of Sciences, Beijing; 100049, China;
推荐引用方式 GB/T 7714	Xie, Zhongye,Tang, Yan,Wei, Haojie,et al. Optical sectioning microscopy for multilayer structure with micro-scale air gaps measurement[J]. IEEE Photonics Technology Letters,2019,31(2):141-144.
APA	Xie, Zhongye,Tang, Yan,Wei, Haojie,Liu, Junbo,He, Yu,&Hu, Song.(2019).Optical sectioning microscopy for multilayer structure with micro-scale air gaps measurement.IEEE Photonics Technology Letters,31(2),141-144.
MLA	Xie, Zhongye,et al."Optical sectioning microscopy for multilayer structure with micro-scale air gaps measurement".IEEE Photonics Technology Letters 31.2(2019):141-144.