Friction Performance and Mechanism of the Molybdenum Disulfide Film in Carbon Dioxide Atmosphere
Chen, Shibo; Huo, Lei; Lu, Zhaoxia; Pu, Jibin; Hou, Baorong
刊名ECS JOURNAL OF SOLID STATE SCIENCE AND TECHNOLOGY
2020
卷号9期号:5
关键词1ST PRINCIPLES MONOLAYER MOS2 ADSORPTION CO2 COATINGS EVOLUTION BEHAVIOR
DOI10.1149/2162-8777/ab96aa
英文摘要In this work, the tribological properties of MoS2 films were investigated in air, vacuum and carbon dioxide environments by means of experiments and First-principles calculations. The results showed that the MoS2 film had the lowest and more stable coefficient of friction in carbon dioxide atmosphere than that in other environments. The MoS2 film usually loses some S atoms to produce S-vacancy defects during sputtering deposition, which can be filled by carbon dioxide molecules in a way of chemisorption. The strong repulsive force always existed at the interfaces of MoS2 adsorbed with carbon dioxide molecules, which was responsible for the low friction coefficient of MoS2 films in carbon dioxide. In the future, the MoS2 film is likely to be widely used on Mars that is well known for its CO2-rich atmosphere. (C) 2020 The Author(s). Published on behalf of The Electrochemical Society by IOP Publishing Limited.
学科主题Materials Science ; Physics
内容类型期刊论文
源URL[http://ir.nimte.ac.cn/handle/174433/20745]  
专题2020专题
作者单位Lu, ZX (corresponding author), Guangxi Univ, Sch Chem & Chem Engn, Nanning 530004, Peoples R China.
推荐引用方式
GB/T 7714
Chen, Shibo,Huo, Lei,Lu, Zhaoxia,et al. Friction Performance and Mechanism of the Molybdenum Disulfide Film in Carbon Dioxide Atmosphere[J]. ECS JOURNAL OF SOLID STATE SCIENCE AND TECHNOLOGY,2020,9(5).
APA Chen, Shibo,Huo, Lei,Lu, Zhaoxia,Pu, Jibin,&Hou, Baorong.(2020).Friction Performance and Mechanism of the Molybdenum Disulfide Film in Carbon Dioxide Atmosphere.ECS JOURNAL OF SOLID STATE SCIENCE AND TECHNOLOGY,9(5).
MLA Chen, Shibo,et al."Friction Performance and Mechanism of the Molybdenum Disulfide Film in Carbon Dioxide Atmosphere".ECS JOURNAL OF SOLID STATE SCIENCE AND TECHNOLOGY 9.5(2020).
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