Experimental investigation of sheath effects on I-V traces of strongly electron emitting probes

doi:10.1088/1361-6595/ab60dd

	Experimental investigation of sheath effects on I-V traces of strongly electron emitting probes
	Yip, Chi-Shung 2; Jin, Chenyao 2; Zhang, Wei 2; Xu, Guo Sheng 2; Hershkowitz, Noah 1
刊名	PLASMA SOURCES SCIENCE & TECHNOLOGY
	2020-02-01
卷号	29
关键词	sheaths plasma diagnostics electron emission basic plasma physics
ISSN号	0963-0252
DOI	10.1088/1361-6595/ab60dd
通讯作者	Zhang, Wei(zhangwei@ipp.ac.cn) ; Xu, Guo Sheng(gsxu@ipp.ac.cn)
英文摘要	I-V traces of strongly emitting emissive probes are investigated in a multidiople filament discharge. It is found that at sufficiently high neutral pressure and emitting current, the variation of the I-V traces and their associated inflection points no longer follow the previous predictions of space charge limited (SCL) models. A new, steep slope region of the I-V trace appears near the plasma potential when the probe is strongly emitting, causing the inflection point and the floating potential to increase towards the plasma potential as emission current increases, rather than staying constant. This is, to our knowledge, the first experimental evidence that the effects predicted by Campanell et al's inverse sheath theory (2017 Physics of Plasmas 24 057101) not only affect the floating potential but also a region in the I-V trace of an emissive probe. It is also found that the double inflection point structure when the probe is biased below the ionization energy of the working gas is highly likely to be an emission retardation effect from enhanced virtual cathode formation due to the increased local electron density. The implications of these findings on hot cathode sources are briefly discussed.
资助项目	Chinese Academy of Science Hundred Youth Talent Program ; CAS Key Research Program of Frontier Sciences grant[QYZDB-SSW-SLH001] ; National Natural Science Foundation of China[11875285] ; National Natural Science Foundation of China[11575248] ; National Natural Science Foundation of China[11505220] ; US National Science Foundation[1804654]
WOS关键词	EDGE
WOS研究方向	Physics
语种	英语
出版者	IOP PUBLISHING LTD
WOS记录号	WOS:000537715000001
资助机构	Chinese Academy of Science Hundred Youth Talent Program ; CAS Key Research Program of Frontier Sciences grant ; National Natural Science Foundation of China ; US National Science Foundation
内容类型	期刊论文
源URL	[http://ir.hfcas.ac.cn:8080/handle/334002/103069]
专题	中国科学院合肥物质科学研究院
通讯作者	Zhang, Wei; Xu, Guo Sheng
作者单位	1.Univ Wisconsin, Dept Engn Phys, Madison, WI 53706 USA 2.Chinese Acad Sci, Inst Plasma Phys, Hefei 230031, Peoples R China
推荐引用方式 GB/T 7714	Yip, Chi-Shung,Jin, Chenyao,Zhang, Wei,et al. Experimental investigation of sheath effects on I-V traces of strongly electron emitting probes[J]. PLASMA SOURCES SCIENCE & TECHNOLOGY,2020,29.
APA	Yip, Chi-Shung,Jin, Chenyao,Zhang, Wei,Xu, Guo Sheng,&Hershkowitz, Noah.(2020).Experimental investigation of sheath effects on I-V traces of strongly electron emitting probes.PLASMA SOURCES SCIENCE & TECHNOLOGY,29.
MLA	Yip, Chi-Shung,et al."Experimental investigation of sheath effects on I-V traces of strongly electron emitting probes".PLASMA SOURCES SCIENCE & TECHNOLOGY 29(2020).