Manufacture of semiconductor light-emitting element
OKAZAKI JIRO
1986-07-12
著作权人FUJITSU LTD
专利号JP1986154091A
国家日本
文献子类发明申请
其他题名Manufacture of semiconductor light-emitting element
英文摘要PURPOSE:To ensure the use for a prolonged term by forming an InGaAsP contact layer, on the surface of which In particles do not adhere. CONSTITUTION:A laminated semiconductor layer is grown through a liquid phase epitaxial growth method, and a P-type InGaAsP contact layer 7 is grown in thickness of approximately 0.5mum after the growth of a layer such as a P-type InP clad layer 6 in the same manner as conventional devices, but an InP cover layer 11 is grown in thickness of approximately 0.5mum successively without completing laminating growth at that time. Consequently, the generation of In particles 10 which have adhered on the contact layer 7 can be transferred onto the cover layer 11, and the interface on which there is no In particle 10 is shaped between the contact layer 7 and the cover layer 1 The surface of the cover layer 11 is washed by a mixed liquid in which HF and HNO3 are mixed at the rate of 1: In is easy to dissolve and InP is difficult to dissolve to the mixed liquid, thus selectively removing In particles adhering on the cover layer 1 The cover layer 11 is removed through etching, thus completing the formation of the contact layer 7.
公开日期1986-07-12
申请日期1984-12-26
状态失效
内容类型专利
源URL[http://ir.opt.ac.cn/handle/181661/76317]  
专题半导体激光器专利数据库
作者单位FUJITSU LTD
推荐引用方式
GB/T 7714
OKAZAKI JIRO. Manufacture of semiconductor light-emitting element. JP1986154091A. 1986-07-12.
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