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	Manufacture of grating
	HIRATA SHOJI
	1987-07-10
著作权人	SONY CORP
专利号	JP1987155580A
国家	日本
文献子类	发明申请
其他题名	Manufacture of grating
英文摘要	PURPOSE:To manufacture easily and with excellent reproducibility, a grating having a phase shift region corresponding with lambda/4, by forming a photo resist in the manner in which the top part of a grating formed on the upper layer surface of a semiconductor layer having a step difference is exposed, and performing an etching applying the resist as a mask. CONSTITUTION:A step difference 3b is formed by constituting a groove 3a having a period 2L, width L and depth of (h) on the surface of a p-InGaAsP layer 3. After a first grating 5 is formed on the surface of the step difference by a holographic exposure, the first grating 5 having a lambda/4-phase shift region 5b is formed by performing an etching which applies a photo resist 6 formed on the first grating as a mask. A p-InP layer 7, clad layer, is formed thereon, and an objective DFB laser is completed by means of, for example, cleaving along a dot and dash chain line. Consequently, the DFB laser capable of single longitudinal mode oscillation can be manufactured with excellent reproducibility, while a complicated and different technology such as electron beam lithography and the like is not necessary for forming the region 5b.
公开日期	1987-07-10
申请日期	1985-12-27
状态	失效
内容类型	专利
源URL	[http://ir.opt.ac.cn/handle/181661/67214]
专题	半导体激光器专利数据库
作者单位	SONY CORP
推荐引用方式 GB/T 7714	HIRATA SHOJI. Manufacture of grating. JP1987155580A. 1987-07-10.

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