A method of producing a gallium nitride-type light emitting semiconductor device
MOTOKI, KENSAKU
2007-07-04
著作权人SUMITOMO ELECTRIC INDUSTRIES, LTD.
专利号EP1804305A1
国家欧洲专利局
文献子类发明申请
其他题名A method of producing a gallium nitride-type light emitting semiconductor device
英文摘要A method of producing a gallium nitride-type light emitting semiconductor device comprising the steps of growing GaN-type semiconductor epitaxial layers on a (0001) top surface gallium nitride single crystal substrate; forming an electrode on the GaN-type semiconductor epitaxial layers; forming an electrode on a bottom surface of the gallium nitride single crystal substrate; forming scribing lines on the bottom surface of the gallium nitride single crystal substrate along {1-100} planes of the gallium nitride single crystal substrate; cutting the gallium nitride single crystal substrate into chips by cleaving along the scribed lines and obtaining light emitting device chips having sides consisting of {1-100} planes made by natural cleavage.
公开日期2007-07-04
申请日期1999-05-27
状态失效
内容类型专利
源URL[http://ir.opt.ac.cn/handle/181661/67159]  
专题半导体激光器专利数据库
作者单位SUMITOMO ELECTRIC INDUSTRIES, LTD.
推荐引用方式
GB/T 7714
MOTOKI, KENSAKU. A method of producing a gallium nitride-type light emitting semiconductor device. EP1804305A1. 2007-07-04.
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