Method and apparatus for improving temperature performance for GaAsSb/GaAs devices
BOUR, DAVID P.; TAN, MICHAEL R.T.; CHANG, YING-LAN
2004-08-19
著作权人AVAGO TECHNOLOGIES INTERNATIONAL SALES PTE. LIMITED
专利号US20040161005A1
国家美国
文献子类发明申请
其他题名Method and apparatus for improving temperature performance for GaAsSb/GaAs devices
英文摘要A method and apparatus is provided for improving the temperature performance of GaAsSb materials utilizing an AlGaInP confinement structure. An active region containing a GaAsSb quantum well layer and (In)GaAs barrier layers is sandwiched between two AlGaInP confinement layers. AlGaInP confinement structures provide sufficient electron confinement, thereby improving the stability of the threshold current with respect to increasing temperature for GaAsSb/GaAs heterostructures.
公开日期2004-08-19
申请日期2003-02-18
状态授权
内容类型专利
源URL[http://ir.opt.ac.cn/handle/181661/66113]  
专题半导体激光器专利数据库
作者单位AVAGO TECHNOLOGIES INTERNATIONAL SALES PTE. LIMITED
推荐引用方式
GB/T 7714
BOUR, DAVID P.,TAN, MICHAEL R.T.,CHANG, YING-LAN. Method and apparatus for improving temperature performance for GaAsSb/GaAs devices. US20040161005A1. 2004-08-19.
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