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	Multiple band pass filtering for pyrometry in laser based annealing systems
	ADAMS, BRUCE, E.; JENNINGS, DEAN; HUNTER, AARON, M.; MAYUR, ABHILASH, J.; PARIHAR, VIJAY; THOMAS, TIMOTHY, N.
	2007-09-12
著作权人	APPLIED MATERIALS, INC.
专利号	EP1831658A2
国家	欧洲专利局
文献子类	发明申请
其他题名	Multiple band pass filtering for pyrometry in laser based annealing systems
英文摘要	A thermal processing system includes a source of laser radiation emitting at a laser wavelength, beam projection optics disposed between the reflective surface and a substrate support capable of holding a substrate to be processed, a pyrometer responsive to a pyrometer wavelength, and a wavelength responsive optical element having a first optical path for light in a first wavelength range including the laser wavelength, the first optical path being between the source of laser radiation and the beam projection optics, and a second optical path for light in a second wavelength range including the pyrometer wavelength, the second optical path being between the beam projection optics and the pyrometer. The system can further include a pyrometer wavelength blocking filter between the source of laser radiation and the wavelength responsive optical element.
公开日期	2007-09-12
申请日期	2005-10-12
状态	授权
内容类型	专利
源URL	[http://ir.opt.ac.cn/handle/181661/61273]
专题	半导体激光器专利数据库
作者单位	APPLIED MATERIALS, INC.
推荐引用方式 GB/T 7714	ADAMS, BRUCE, E.,JENNINGS, DEAN,HUNTER, AARON, M.,et al. Multiple band pass filtering for pyrometry in laser based annealing systems. EP1831658A2. 2007-09-12.

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