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	Multi-function semiconductor and electronics processing
	HEMENWAY, MARTY; GROSS, KEN; KLINER, DAHV A.V.; FARROW, ROGER
	2018-10-04
著作权人	NLIGHT, INC.
专利号	US20180284490A1
国家	美国
文献子类	发明申请
其他题名	Multi-function semiconductor and electronics processing
英文摘要	A method of tailoring beam characteristics of a laser beam during fabrication of an electronic device. The method includes: providing a substrate comprising one or more layers; adjusting one or more characteristics of a laser beam; and impinging the laser beam having the adjusted beam characteristics on the substrate to carry out at least one process step for fabricating the electronic device. The adjusting of the laser beam comprises: perturbing the laser beam propagating within a first length of fiber to adjust the one or more beam characteristics of the laser beam in the first length of fiber or a second length of fiber or a combination thereof, the second length of fiber having two or more confinement regions; coupling the perturbed laser beam into the second length of fiber; and emitting the laser beam having the adjusted beam characteristics from the second length of fiber.
公开日期	2018-10-04
申请日期	2018-03-23
状态	申请中
内容类型	专利
源URL	[http://ir.opt.ac.cn/handle/181661/54873]
专题	半导体激光器专利数据库
作者单位	NLIGHT, INC.
推荐引用方式 GB/T 7714	HEMENWAY, MARTY,GROSS, KEN,KLINER, DAHV A.V.,et al. Multi-function semiconductor and electronics processing. US20180284490A1. 2018-10-04.

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