Aluminum nitride-based semiconductor deep ultraviolet light-emitting device
YAMAMOTO, SHUHICHIROH; UETA, YOSHIHIRO
2018-03-22
著作权人SHARP KABUSHIKI KAISHA
专利号US20180083173A1
国家美国
文献子类发明申请
其他题名Aluminum nitride-based semiconductor deep ultraviolet light-emitting device
英文摘要A vertically structured, aluminum nitride-based semiconductor deep ultraviolet light-emitting device is provided that exhibits a high light emission efficiency and an improved yield. The aluminum nitride-based semiconductor deep ultraviolet light-emitting device includes: a conductive support substrate; a porous metal film having a conductive macroporous structure with a pore rate of from 10% to 50% inclusive; and an aluminum nitride-based semiconductor layer structural body with a light-emitting layer, the conductive support substrate and the aluminum nitride-based semiconductor layer structural body being bonded with the porous metal film interposed therebetween for electrical connection, wherein the aluminum nitride-based semiconductor deep ultraviolet light-emitting device has an emission peak wavelength of from 220 nm to 300 nm inclusive.
公开日期2018-03-22
申请日期2017-09-21
状态授权
内容类型专利
源URL[http://ir.opt.ac.cn/handle/181661/54820]  
专题半导体激光器专利数据库
作者单位SHARP KABUSHIKI KAISHA
推荐引用方式
GB/T 7714
YAMAMOTO, SHUHICHIROH,UETA, YOSHIHIRO. Aluminum nitride-based semiconductor deep ultraviolet light-emitting device. US20180083173A1. 2018-03-22.
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