Multilayer structure containing a crystal matching layer for increased semiconductor device performance
MACHUCA, FRANCISCO; WEISS, ROBERT
2016-12-29
著作权人TIVRA CORPORATION
专利号US20160380154A1
国家美国
文献子类发明申请
其他题名Multilayer structure containing a crystal matching layer for increased semiconductor device performance
英文摘要A multilayer structure comprising a crystal matching layer deposited on a substrate. The crystal matching layer is capable of being used as an ohmic contact, thermal heat sink, and reflective layer. The unique properties of the crystal matching layer allows for the reduction of size of semiconductor devices, a reduction in the fabrication time of semiconductor devices, high current capabilities, high voltage standoff capabilities, and other advantages.
公开日期2016-12-29
申请日期2016-06-27
状态失效
内容类型专利
源URL[http://ir.opt.ac.cn/handle/181661/54708]  
专题半导体激光器专利数据库
作者单位TIVRA CORPORATION
推荐引用方式
GB/T 7714
MACHUCA, FRANCISCO,WEISS, ROBERT. Multilayer structure containing a crystal matching layer for increased semiconductor device performance. US20160380154A1. 2016-12-29.
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