Beam shaping and practical methods of reducing loss associated with mating external sources and optics to thin silicon waveguides
GHIRON, MARGARET; GOTHOSKAR, PRAKASH; MONTGOMERY, ROBERT, KEITH; PATEL, VIPULKUMAR; PATHAK, SOHAM; SHASTRI, KALPENDU; YANUSHEFSKI, KATHERINE, A.
2006-05-31
著作权人SIOPTICAL, INC.
专利号EP1616209A4
国家欧洲专利局
文献子类发明申请
其他题名Beam shaping and practical methods of reducing loss associated with mating external sources and optics to thin silicon waveguides
英文摘要A practical realization for achieving and maintaining high-efficiency transfer of light from input and output free-space optics to a high-index waveguide of sub-micron thickness is described. The required optical elements and methods of fabricating, aligning, and assembling these elements are discussed. Maintaining high coupling efficiency reliably over realistic ranges of device operating parameters is discussed in the context of the preferred embodiments.
公开日期2006-05-31
申请日期2004-04-12
状态失效
内容类型专利
源URL[http://ir.opt.ac.cn/handle/181661/53303]  
专题半导体激光器专利数据库
作者单位SIOPTICAL, INC.
推荐引用方式
GB/T 7714
GHIRON, MARGARET,GOTHOSKAR, PRAKASH,MONTGOMERY, ROBERT, KEITH,et al. Beam shaping and practical methods of reducing loss associated with mating external sources and optics to thin silicon waveguides. EP1616209A4. 2006-05-31.
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