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	Photo-patternable mono-phase fluorinated organometallic sol-gels for integrated optics and methods of fabrication
	FARDAD, M.A.; LIANG, WEI; ZHANG, YADONG
	2004-02-19
著作权人	NP PHOTONICS, INC.
专利号	US20040033309A1
国家	美国
文献子类	发明申请
其他题名	Photo-patternable mono-phase fluorinated organometallic sol-gels for integrated optics and methods of fabrication
英文摘要	A photo-patternable perfluorinated silane sol-gel material is presented that exhibits a high refractive index and propagation losses below 1 dB/cm at the telecommunication wavelengths. The sol-gels are produced with general formula [(CH2)n, R'-Si(O)2]x-[Si(O)4]y-[R'-Si(O)3]z-[R''(CH2)n-M(O)3]w-[R'''(CH2)n-Si(O)3]v where O is oxygen, Si is silicon, M is a metal alkoxyde known to form bonds with organic compounds through oxygen donor ligands, and where , R'' and R''' are photo cross-linkable groups, and where (CH2)n are alkyl spacers with n being an integer >=0. The sol-gels can be fabricated to produce complex waveguide structures directly onto silica-on-silicon substrates with low bending losses.
公开日期	2004-02-19
申请日期	2002-08-15
状态	失效
内容类型	专利
源URL	[http://ir.opt.ac.cn/handle/181661/52818]
专题	半导体激光器专利数据库
作者单位	NP PHOTONICS, INC.
推荐引用方式 GB/T 7714	FARDAD, M.A.,LIANG, WEI,ZHANG, YADONG. Photo-patternable mono-phase fluorinated organometallic sol-gels for integrated optics and methods of fabrication. US20040033309A1. 2004-02-19.

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