High band-gap opto-electronic device and method for making same
KUO, CHIH-PING; FLETCHER, ROBERT M.; OSENTOWSKI, TIMOTHY D.
1995-11-15
著作权人HEWLETT-PACKARD COMPANY
专利号EP0378919B1
国家欧洲专利局
文献子类授权发明
其他题名High band-gap opto-electronic device and method for making same
英文摘要A high band-gap opto-electronic device is formed by epitaxially growing the device section (150,350,450,550) in a lattice-matched (AlxGa1-x)yIn1-yP-­GaAs system. The band-gap of the epitaxial layer increases with x. Instead of growing the device section (150,350,450,550) directly on the GaAs substrate (100,300,400,500), a layer of (AlxGa1-x)yIn1-yP, (150;320,330,340;420,430;530,540) graded in x and in temperature while maintaining substantially y=0.5, is grown as a transitional layer. The high band-gap device structures include homojunctions, heterojunctions and particularly a separate confinement quantum well heterostructures. Various embodiments of the invention include devices on absorbing substrates and on transparent substrates, and devices incorporating strained-layer superlattices.
公开日期1995-11-15
申请日期1989-12-18
状态失效
内容类型专利
源URL[http://ir.opt.ac.cn/handle/181661/45922]  
专题半导体激光器专利数据库
作者单位HEWLETT-PACKARD COMPANY
推荐引用方式
GB/T 7714
KUO, CHIH-PING,FLETCHER, ROBERT M.,OSENTOWSKI, TIMOTHY D.. High band-gap opto-electronic device and method for making same. EP0378919B1. 1995-11-15.
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