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	System for adjusting the wavelength light output of a semiconductor device using hydrogenation
	CHUA, CHRISTOPHER L.; KNEISSL, MICHAEL A.; JOHNSON, NOBLE M.; KIESEL, PETER
	2010-07-27
著作权人	PALO ALTO RESEARCH CENTER INCORPORATED
专利号	US7764721
国家	美国
文献子类	授权发明
其他题名	System for adjusting the wavelength light output of a semiconductor device using hydrogenation
英文摘要	A method and structure for adjusting the wavelength output of a semiconductor device is described. In the method, the hydrogen concentration in an active region of the semiconductor device is adjusted either during fabrication or after the device has been fabricated. The adjustment provides a simple technique for fine tuning many device types including regular lasers and VCSEL structures. The adjustment also allows for mass production of lasers of many different frequencies on a single wafer substrate, a system particularly desirable for wavelength division multiplexing systems.
公开日期	2010-07-27
申请日期	2005-12-15
状态	失效
内容类型	专利
源URL	[http://ir.opt.ac.cn/handle/181661/45047]
专题	半导体激光器专利数据库
作者单位	PALO ALTO RESEARCH CENTER INCORPORATED
推荐引用方式 GB/T 7714	CHUA, CHRISTOPHER L.,KNEISSL, MICHAEL A.,JOHNSON, NOBLE M.,et al. System for adjusting the wavelength light output of a semiconductor device using hydrogenation. US7764721. 2010-07-27.

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