Radiation response of partially-depleted MOS transistors fabricated in the fluorinated SIMOX wafers | |
Li, N ; Zhang, GQ ; Liu, ZL ; Fan, K ; Zheng, ZS ; Lin, Q ; Zhang, ZX ; Lin, CL | |
2004 | |
会议名称 | 7th international conference on solid-state and integrated circuits technology |
会议日期 | oct 18-21, 2004 |
会议地点 | beijing, peoples r china |
关键词 | SIMOX fluorine ionizing radiation |
页码 | vols 1- 3 proceedings: 851-855 |
通讯作者 | li, n, chinese acad sci, inst semicond, beijing 100083, peoples r china. |
中文摘要 | ionizing radiation response of partially-depleted mos transistors fabricated in the, fluorinated simox wafers has been investigated. the experimental data show that the, radiation-induced threshold voltage shift of pmosfets and nmosfets, as well as the radiation-induced increase of off-state leakage current of nmosfets can be restrained by implanting fluorine ions into the buried oxide of simox wafers. |
英文摘要 | ionizing radiation response of partially-depleted mos transistors fabricated in the, fluorinated simox wafers has been investigated. the experimental data show that the, radiation-induced threshold voltage shift of pmosfets and nmosfets, as well as the radiation-induced increase of off-state leakage current of nmosfets can be restrained by implanting fluorine ions into the buried oxide of simox wafers.; zhangdi于2010-03-29批量导入; made available in dspace on 2010-03-29t06:06:33z (gmt). no. of bitstreams: 1 2429.pdf: 148125 bytes, checksum: dd2621eb4f55fbf1c2e215cc2f4b52af (md5) previous issue date: 2004; chinese inst elect.; ieee beijing sect.; ieee elect devices soc.; ieee eds beijing chapter.; ieee solid-state circuits soc.; ieee sscs beijing chapter.; japan soc appl phys.; iee elect div.; ursi commiss d.; inst elect engineers korea.; natl nat sci fdn china.; beijing municipal bureau ind dev.; peking univ.; chinese acad sci, inst semicond, beijing 100083, peoples r china |
收录类别 | CPCI-S |
会议主办者 | chinese inst elect.; ieee beijing sect.; ieee elect devices soc.; ieee eds beijing chapter.; ieee solid-state circuits soc.; ieee sscs beijing chapter.; japan soc appl phys.; iee elect div.; ursi commiss d.; inst elect engineers korea.; natl nat sci fdn china.; beijing municipal bureau ind dev.; peking univ. |
会议录 | 2004 7th international conference on solid-state and integrated circuits technology |
会议录出版者 | ieee ; 345 e 47th st, new york, ny 10017 usa |
会议录出版地 | 345 e 47th st, new york, ny 10017 usa |
学科主题 | 微电子学 |
语种 | 英语 |
ISBN号 | 0-7803-8511-x |
内容类型 | 会议论文 |
源URL | [http://ir.semi.ac.cn/handle/172111/10092] |
专题 | 半导体研究所_中国科学院半导体研究所(2009年前) |
推荐引用方式 GB/T 7714 | Li, N,Zhang, GQ,Liu, ZL,et al. Radiation response of partially-depleted MOS transistors fabricated in the fluorinated SIMOX wafers[C]. 见:7th international conference on solid-state and integrated circuits technology. beijing, peoples r china. oct 18-21, 2004. |
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