Analysis of atomic force microscopic results of InAs islands formed by molecular beam epitaxy
Xu B
刊名journal of crystal growth
1998
卷号192期号:3-4页码:376-380
关键词nanometer island InAs molecular beam epitaxy atomic force microscopy quantum dot GAAS LASERS GROWTH ASSEMBLED QUANTUM DOTS
ISSN号0022-0248
通讯作者gong q,chinese acad sci,inst semicond,lab semicond mat sci,pob 912,beijing 100083,peoples r china.
中文摘要atomic force microscopy (afm) measurements of nanometer-sized islands formed by 2 monolayers of inas by molecular beam epitaxy have been carried out and the scan line of individual islands was extracted from raw afm data for investigation. it is found that the base widths of nanometer-sized islands obtained by afm are not reliable due to the finite size and shape of the contacting probe. a simple model is proposed to analyze the deviation of the measured value from the real value of the base width of inas islands. (c) 1998 elsevier science b.v. all rights reserved.
学科主题半导体材料
收录类别SCI
语种英语
公开日期2010-08-12
内容类型期刊论文
源URL[http://ir.semi.ac.cn/handle/172111/13108]  
专题半导体研究所_中国科学院半导体研究所(2009年前)
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Xu B. Analysis of atomic force microscopic results of InAs islands formed by molecular beam epitaxy[J]. journal of crystal growth,1998,192(3-4):376-380.
APA Xu B.(1998).Analysis of atomic force microscopic results of InAs islands formed by molecular beam epitaxy.journal of crystal growth,192(3-4),376-380.
MLA Xu B."Analysis of atomic force microscopic results of InAs islands formed by molecular beam epitaxy".journal of crystal growth 192.3-4(1998):376-380.
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