Modeling and optimization of semiconductor manufacturing process with neural networks
Wang SJ ; Chen YM ; Wang XD ; Li ZZ ; Shi LC
刊名chinese journal of electronics
2000
卷号9期号:1页码:1-5
关键词feedforward neural networks optimization radial basis function semiconductor manufacturing
ISSN号1022-4653
通讯作者wang sj,chinese acad sci,inst semicond,beijing 100083,peoples r china.
中文摘要a neural network-based process model is proposed to optimize the semiconductor manufacturing process. being different from some works in several research groups which developed neural network-based models to predict process quality with a set of process variables of only single manufacturing step, we applied this model to wafer fabrication parameters control and wafer lot yield optimization. the original data are collected from a wafer fabrication line, including technological parameters and wafer test results. the wafer lot yield is taken as the optimization target. learning from historical technological records and wafer test results, the model can predict the wafer yield. to eliminate the "bad" or noisy samples from the sample set, an experimental method was used to determine the number of hidden units so that both good learning ability and prediction capability can be obtained.
学科主题半导体器件
收录类别SCI
语种英语
公开日期2010-08-12
内容类型期刊论文
源URL[http://ir.semi.ac.cn/handle/172111/12590]  
专题半导体研究所_中国科学院半导体研究所(2009年前)
推荐引用方式
GB/T 7714
Wang SJ,Chen YM,Wang XD,et al. Modeling and optimization of semiconductor manufacturing process with neural networks[J]. chinese journal of electronics,2000,9(1):1-5.
APA Wang SJ,Chen YM,Wang XD,Li ZZ,&Shi LC.(2000).Modeling and optimization of semiconductor manufacturing process with neural networks.chinese journal of electronics,9(1),1-5.
MLA Wang SJ,et al."Modeling and optimization of semiconductor manufacturing process with neural networks".chinese journal of electronics 9.1(2000):1-5.
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