Magnetic property and interface structure of Ta/NiO/NiFe/Ta

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	Magnetic property and interface structure of Ta/NiO/NiFe/Ta
	Yu GH ; Chai CL ; Zhu FW ; Xiao JM
刊名	chinese science bulletin
	2001
卷号	46 期号:5 页码:438-440
关键词	NiO interface reaction X-ray photoelectron spectroscopy exchange coupling NIO FILMS LAYERS
ISSN号	1001-6538
通讯作者	yu gh,univ sci & technol beijing,dept mat phys,beijing 100083,peoples r china.
中文摘要	ta/nio/nife/ta multilayers, utilizing ta as buffer layer, were prepared by rf reactive and de magnetron sputtering. the exchange coupling field between nio and nife reached a maximum value of 9.6x10(3) a/m at a nio film thickness of 50 nm. the composition and chemical states at interface region of ta/nio/ta were studied by using the x-ray photoelectron spectroscopy (xps) and peak decomposition technique. the results show that there is an "intermixing layer" at the ta/nio land nio/ta) interface due to a thermodynamically favorable reaction 2ta + 5nio = 5ni + ta2o5. this interface reaction has a great effect on exchange coupling. the thickness of ni+nio estimated by xps depth. profiles is about 8-10 nm.
学科主题	半导体物理
收录类别	SCI
语种	英语
公开日期	2010-08-12
内容类型	期刊论文
源URL	[http://ir.semi.ac.cn/handle/172111/12234]
专题	半导体研究所_中国科学院半导体研究所（2009年前）
推荐引用方式 GB/T 7714	Yu GH,Chai CL,Zhu FW,et al. Magnetic property and interface structure of Ta/NiO/NiFe/Ta[J]. chinese science bulletin,2001,46(5):438-440.
APA	Yu GH,Chai CL,Zhu FW,&Xiao JM.(2001).Magnetic property and interface structure of Ta/NiO/NiFe/Ta.chinese science bulletin,46(5),438-440.
MLA	Yu GH,et al."Magnetic property and interface structure of Ta/NiO/NiFe/Ta".chinese science bulletin 46.5(2001):438-440.