Structural and optical characterization of Zn1-xCdxO thin films deposited by dc reactive magnetron sputtering

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	Structural and optical characterization of Zn1-xCdxO thin films deposited by dc reactive magnetron sputtering
	Ma DW ; Ye ZZ ; Huang JY ; Zhao BH ; Wan SK ; Sun XH ; Wang ZG
刊名	chinese physics letters
	2003
卷号	20 期号:6 页码:942-943
关键词	PHASE EPITAXIAL-GROWTH PHOTOLUMINESCENT PROPERTIES SPRAY-PYROLYSIS ZNO MGXZN1-XO
ISSN号	0256-307x
通讯作者	ma dw,zhejiang univ,state key lab silicon mat,hangzhou 310027,peoples r china.
中文摘要	zn1-xcdxo crystal thin films with different compositions were prepared on silicon and sapphire substrates by the dc reactive magnetron sputtering technique. x-ray diffraction measurements show that the zn1-xcdxo films are of completely (002)-preferred orientation for x less than or equal to 0.6. for x = 0.8, the elm is a mixture of zno hexagonal wurtzite crystals and cdo cubic crystals. for pure cdo, it is highly (200) preferential-oriented. photoluminescence spectrum measurement shows that the zn1-xcdxo (x = 0.2) thin film has a redshift of 0.14 ev from that of zno reported previously.
学科主题	半导体物理
收录类别	SCI
语种	英语
公开日期	2010-08-12
内容类型	期刊论文
源URL	[http://ir.semi.ac.cn/handle/172111/11530]
专题	半导体研究所_中国科学院半导体研究所（2009年前）
推荐引用方式 GB/T 7714	Ma DW,Ye ZZ,Huang JY,et al. Structural and optical characterization of Zn1-xCdxO thin films deposited by dc reactive magnetron sputtering[J]. chinese physics letters,2003,20(6):942-943.
APA	Ma DW.,Ye ZZ.,Huang JY.,Zhao BH.,Wan SK.,...&Wang ZG.(2003).Structural and optical characterization of Zn1-xCdxO thin films deposited by dc reactive magnetron sputtering.chinese physics letters,20(6),942-943.
MLA	Ma DW,et al."Structural and optical characterization of Zn1-xCdxO thin films deposited by dc reactive magnetron sputtering".chinese physics letters 20.6(2003):942-943.