Room-temperature observation of electron resonant tunneling through InAs/AlAs quantum dots
Ye XL; Xu B
刊名electrochemical and solid state letters
2006
卷号9期号:5页码:g167-g170
关键词SEMICONDUCTOR-DEVICES TRANSPORT STATES BISTABILITY VOLTAGE LASERS DIODE
ISSN号1099-0062
通讯作者sun, j, chinese acad sci, inst semicond, key lab semicond mat sci, beijing 100083, peoples r china. e-mail: albertjefferson@sohu.com
中文摘要molecular beam epitaxy is employed to manufacture self-assembled inas/alas quantum-dot resonant tunneling diodes. the resonant tunneling current is superimposed on the thermal current, and together they make up the total electron transport in devices. steps in current-voltage characteristics and peaks in capacitance-voltage characteristics are explained as electron resonant tunneling via quantum dots at 77 or 300 k, and thus resonant tunneling is observed at room temperature in iii-v quantum-dot materials. hysteresis loops in the curves are attributed to hot electron injection/emission process of quantum dots, which indicates the concomitant charging/discharging effect. (c) 2006 the electrochemical society.
学科主题半导体材料
收录类别SCI
语种英语
公开日期2010-04-11
内容类型期刊论文
源URL[http://ir.semi.ac.cn/handle/172111/10766]  
专题半导体研究所_中国科学院半导体研究所(2009年前)
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GB/T 7714
Ye XL,Xu B. Room-temperature observation of electron resonant tunneling through InAs/AlAs quantum dots[J]. electrochemical and solid state letters,2006,9(5):g167-g170.
APA Ye XL,&Xu B.(2006).Room-temperature observation of electron resonant tunneling through InAs/AlAs quantum dots.electrochemical and solid state letters,9(5),g167-g170.
MLA Ye XL,et al."Room-temperature observation of electron resonant tunneling through InAs/AlAs quantum dots".electrochemical and solid state letters 9.5(2006):g167-g170.
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