Low threshold current density 1.5 mu m strained-MQW laser by n-type modulation-doping
Zhang RY ; Wang W ; Zhou F ; Bian J ; Zhao LJ ; Zhu HL ; Jian SS
刊名pricm 5: the fifth pacific rim international conference on advanced materials and processing
2005
卷号pts 1-5期号:475-479页码:1663-1667
关键词1.5 mu m InGaAsP/InGaAsP
ISSN号0255-5476
通讯作者zhang, ry, chinese acad sci, inst semicond, natl res ctr optoelect technol, pob 912, beijing 100083, peoples r china. 电子邮箱地址: ryzhang@red.semi.ac.cn ; wwang@red.semi.ac.cn
中文摘要1.5 mu m. n-type modulation-doping ingaasp/ingaasp strained multiple quantum wells grown by low pressure metalorganic chemistry vapor decomposition technology is reported for the first time in the world. n-type modulation-doped lasers exhibit much lower threshold current densities than conventional lasers with undoped barrier layers. the lowest threshold current density we obtained was 1052.5 a/cm(2) for 1000 mu m long lasers with seven quantum wells. the estimated threshold current density for an infinite cavity length was 94.72a/cm(2)/well, reduced by 23.3% compared with undoped barrier lasers. the n-type modulation doping effects on the lasing characteristics in 1.5 mu m devices have been demonstrated.
学科主题光电子学
收录类别SCI
语种英语
公开日期2010-03-17
内容类型期刊论文
源URL[http://ir.semi.ac.cn/handle/172111/8760]  
专题半导体研究所_中国科学院半导体研究所(2009年前)
推荐引用方式
GB/T 7714
Zhang RY,Wang W,Zhou F,et al. Low threshold current density 1.5 mu m strained-MQW laser by n-type modulation-doping[J]. pricm 5: the fifth pacific rim international conference on advanced materials and processing,2005,pts 1-5(475-479):1663-1667.
APA Zhang RY.,Wang W.,Zhou F.,Bian J.,Zhao LJ.,...&Jian SS.(2005).Low threshold current density 1.5 mu m strained-MQW laser by n-type modulation-doping.pricm 5: the fifth pacific rim international conference on advanced materials and processing,pts 1-5(475-479),1663-1667.
MLA Zhang RY,et al."Low threshold current density 1.5 mu m strained-MQW laser by n-type modulation-doping".pricm 5: the fifth pacific rim international conference on advanced materials and processing pts 1-5.475-479(2005):1663-1667.
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