Photoemission study of chemisorption and Fermi-level pinning at K/GaAs(100) interface with synchrotron radiation | |
Sun, MH ; Zhao, TX ; Jia, CY ; Xu, PS ; Lu, ED ; Hsu, CC ; Ji, H | |
刊名 | applied surface science |
2005 | |
卷号 | 249期号:1-4页码:340-345 |
关键词 | X-ray photoelectron spectroscopy |
ISSN号 | 0169-4332 |
通讯作者 | ji, h, peking univ, sch phys, natl key lab mesoscop phys, beijing 100871, peoples r china. 电子邮箱地址: jihang@pku.edu.cn |
中文摘要 | the adsorption of k on the n-gaas(i 0 0) surface was investigated by x-ray photoelectron spectroscopy (xps) and synchrotron radiation photoemission spectroscopy (sr-pes). the ga3d and as3d core level was measured for clean and k adsorbed gaas(i 0 0) surface. the adsorption of k induced chemical reaction between k and as, and the k-as reactant formed when the k coverage theta > i ml. the chemical reaction between k and ga did not occur, but ga atoms were exchanged by k atoms. from the data of band bending, the schottky barrier is 0.70 ev. the fermi-level pinning was not caused by defect levels. the probable reason is that the dangling bonds of surface ga atoms were filled by the outer-shell electrons of k atoms, forming a half-filled surface state. the fermi-level pinning was caused by this half-filled surface state. (c) 2004 elsevier b.v. all rights reserved. |
学科主题 | 半导体物理 |
收录类别 | SCI |
语种 | 英语 |
公开日期 | 2010-03-17 |
内容类型 | 期刊论文 |
源URL | [http://ir.semi.ac.cn/handle/172111/8634] |
专题 | 半导体研究所_中国科学院半导体研究所(2009年前) |
推荐引用方式 GB/T 7714 | Sun, MH,Zhao, TX,Jia, CY,et al. Photoemission study of chemisorption and Fermi-level pinning at K/GaAs(100) interface with synchrotron radiation[J]. applied surface science,2005,249(1-4):340-345. |
APA | Sun, MH.,Zhao, TX.,Jia, CY.,Xu, PS.,Lu, ED.,...&Ji, H.(2005).Photoemission study of chemisorption and Fermi-level pinning at K/GaAs(100) interface with synchrotron radiation.applied surface science,249(1-4),340-345. |
MLA | Sun, MH,et al."Photoemission study of chemisorption and Fermi-level pinning at K/GaAs(100) interface with synchrotron radiation".applied surface science 249.1-4(2005):340-345. |
个性服务 |
查看访问统计 |
相关权益政策 |
暂无数据 |
收藏/分享 |
除非特别说明,本系统中所有内容都受版权保护,并保留所有权利。
修改评论