Influence of pH and abrasive concentration on polishing rate of amorphous Ge(2)Sb(2)Te(5) film in chemical mechanical polishing

	Influence of pH and abrasive concentration on polishing rate of amorphous Ge(2)Sb(2)Te(5) film in chemical mechanical polishing
	Zhang, ZF ; Liu, WL ; song, zt(重点实验室）
刊名	JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B
	2011
卷号	29 期号:1 页码:11020
关键词	Engineering Physics Electrical & Electronic Nanoscience & Nanotechnology Applied
ISSN号	1071-1023
学科主题	Engineering; Science & Technology - Other Topics; Physics
收录类别	SCI
原文出处	10.1116/1.3532980
语种	英语
公开日期	2013-05-10
内容类型	期刊论文
源URL	[http://ir.sim.ac.cn/handle/331004/115494]
专题	上海微系统与信息技术研究所_信息功能材料国家重点实验室2008-2012_期刊论文
推荐引用方式 GB/T 7714	Zhang, ZF,Liu, WL,song, zt. Influence of pH and abrasive concentration on polishing rate of amorphous Ge(2)Sb(2)Te(5) film in chemical mechanical polishing[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B,2011,29(1):11020.
APA	Zhang, ZF,Liu, WL,&song, zt.(2011).Influence of pH and abrasive concentration on polishing rate of amorphous Ge(2)Sb(2)Te(5) film in chemical mechanical polishing.JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B,29(1),11020.
MLA	Zhang, ZF,et al."Influence of pH and abrasive concentration on polishing rate of amorphous Ge(2)Sb(2)Te(5) film in chemical mechanical polishing".JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B 29.1(2011):11020.