Layer-by-layer thinning of graphene by plasma irradiation and post-annealing

	Layer-by-layer thinning of graphene by plasma irradiation and post-annealing
	Yang, XC ; Tang, SJ ; Ding, GQ ; Xie, XM(重点实验室） ; Jiang, MH(重点实验室） ; Huang, FQ
刊名	NANOTECHNOLOGY
	2012
卷号	23 期号:2 页码:25704
关键词	Nanoscience & Nanotechnology Materials Science Physics Multidisciplinary Applied
ISSN号	0957-4484
学科主题	Science & Technology - Other Topics; Materials Science; Physics
收录类别	SCI
原文出处	10.1088/0957-4484/23/2/025704
语种	英语
公开日期	2013-05-10
内容类型	期刊论文
源URL	[http://ir.sim.ac.cn/handle/331004/115203]
专题	上海微系统与信息技术研究所_信息功能材料国家重点实验室2008-2012_期刊论文
推荐引用方式 GB/T 7714	Yang, XC,Tang, SJ,Ding, GQ,et al. Layer-by-layer thinning of graphene by plasma irradiation and post-annealing[J]. NANOTECHNOLOGY,2012,23(2):25704.
APA	Yang, XC,Tang, SJ,Ding, GQ,Xie, XM,Jiang, MH,&Huang, FQ.(2012).Layer-by-layer thinning of graphene by plasma irradiation and post-annealing.NANOTECHNOLOGY,23(2),25704.
MLA	Yang, XC,et al."Layer-by-layer thinning of graphene by plasma irradiation and post-annealing".NANOTECHNOLOGY 23.2(2012):25704.