Enhancement of field emission of the ZnO film by the reduced work function and the increased conductivity via hydrogen plasma treatment

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	Enhancement of field emission of the ZnO film by the reduced work function and the increased conductivity via hydrogen plasma treatment
	Zhang XW; Yin ZG; You JB
刊名	applied physics letters
	2009
卷号	94 期号:26 页码:art. no. 262105
关键词	atomic force microscopy field emission hydrogen II-VI semiconductors plasma materials processing sputter deposition wide band gap semiconductors work function zinc compounds
ISSN号	0003-6951
通讯作者	zhang xw chinese acad sci inst semicond key lab semicond mat sci beijing 100083 peoples r china. e-mail address: xwzhang@semi.ac.cn
中文摘要	the zno films deposited by magnetron sputtering were treated by h/o plasma. it is found that the field emission (fe) characteristics of the zno film are considerably improved after h-plasma treatment and slightly deteriorated after o-plasma treatment. the improvement of fe characteristics is attributed to the reduced work function and the increased conductivity of the zno h films. conductive atomic force microscopy was employed to investigate the effect of the plasma treatment on the nanoscale conductivity of zno, these findings correlate well with the fe data and facilitate a clearer description of electron emission from the zno h films.
学科主题	半导体物理
收录类别	SCI
资助信息	national natural science foundation of china 50601025 60876031"863" project of china 2009aa03z305 postgraduate research, innovation and practice this work was financially supported by the national natural science foundation of china (50601025 and 60876031) and the "863" project of china (2009aa03z305). j. b. you thanks the cas special grant for postgraduate research, innovation and practice.
语种	英语
公开日期	2010-03-08
内容类型	期刊论文
源URL	[http://ir.semi.ac.cn/handle/172111/7127]
专题	半导体研究所_中国科学院半导体研究所（2009年前）
推荐引用方式 GB/T 7714	Zhang XW,Yin ZG,You JB. Enhancement of field emission of the ZnO film by the reduced work function and the increased conductivity via hydrogen plasma treatment[J]. applied physics letters,2009,94(26):art. no. 262105.
APA	Zhang XW,Yin ZG,&You JB.(2009).Enhancement of field emission of the ZnO film by the reduced work function and the increased conductivity via hydrogen plasma treatment.applied physics letters,94(26),art. no. 262105.
MLA	Zhang XW,et al."Enhancement of field emission of the ZnO film by the reduced work function and the increased conductivity via hydrogen plasma treatment".applied physics letters 94.26(2009):art. no. 262105.